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Results: 1-9 |
Results: 9
VACUUM-ARC EVAPORATION WITH PROGRAMMABLE EROSION AND DEPOSITION PROFILE
Authors: SIEMROTH P ZIMMER O SCHULKE T VETTER J
Citation: P. Siemroth et al., VACUUM-ARC EVAPORATION WITH PROGRAMMABLE EROSION AND DEPOSITION PROFILE, Surface & coatings technology, 94-5(1-3), 1997, pp. 592-596
GAP FILLING WITH PVD PROCESSES FOR COPPER METALLIZED INTEGRATED-CIRCUITS
Authors: WENZEL C URBANSKY N KLIMES W SIEMROTH P SCHULKE T
Citation: C. Wenzel et al., GAP FILLING WITH PVD PROCESSES FOR COPPER METALLIZED INTEGRATED-CIRCUITS, Microelectronic engineering, 33(1-4), 1997, pp. 31-38
INVESTIGATION OF CATHODE SPOTS AND PLASMA FORMATION OF VACUUM ARCS BYHIGH-SPEED MICROSCOPY AND SPECTROSCOPY
Authors: SIEMROTH P SCHULKE T WITKE T
Citation: P. Siemroth et al., INVESTIGATION OF CATHODE SPOTS AND PLASMA FORMATION OF VACUUM ARCS BYHIGH-SPEED MICROSCOPY AND SPECTROSCOPY, IEEE transactions on plasma science, 25(4), 1997, pp. 571-579
MACROPARTICLE FILTERING OF HIGH-CURRENT VACUUM-ARC PLASMAS
Authors: SCHULKE T ANDERS A SIEMROTH P
Citation: T. Schulke et al., MACROPARTICLE FILTERING OF HIGH-CURRENT VACUUM-ARC PLASMAS, IEEE transactions on plasma science, 25(4), 1997, pp. 660-664
METALLIZATION OF SUBMICRON TRENCHES AND VIAS WITH HIGH-ASPECT-RATIO
Authors: SIEMROTH P WENZEL C KLIMES W SCHULTRICH B SCHULKE T
Citation: P. Siemroth et al., METALLIZATION OF SUBMICRON TRENCHES AND VIAS WITH HIGH-ASPECT-RATIO, Thin solid films, 308, 1997, pp. 455-459
VACUUM-ARC CATHODE SPOTS AS A SELF-SIMILARITY PHENOMENON
Authors: SCHULKE T SIEMROTH P
Citation: T. Schulke et P. Siemroth, VACUUM-ARC CATHODE SPOTS AS A SELF-SIMILARITY PHENOMENON, IEEE transactions on plasma science, 24(1), 1996, pp. 63-64
FUNDAMENTAL PROCESSES IN VACUUM-ARC DEPOSITION
Authors: SIEMROTH P SCHULTRICH B SCHULKE T
Citation: P. Siemroth et al., FUNDAMENTAL PROCESSES IN VACUUM-ARC DEPOSITION, Surface & coatings technology, 74-5(1-3), 1995, pp. 92-96
HIGH-CURRENT ARC - A NEW SOURCE FOR HIGH-RATE DEPOSITION
Authors: SIEMROTH P SCHULKE T WITKE T
Citation: P. Siemroth et al., HIGH-CURRENT ARC - A NEW SOURCE FOR HIGH-RATE DEPOSITION, Surface & coatings technology, 68, 1994, pp. 314-319
SHORT-TIME INVESTIGATION OF LASER AND ARC-ASSISTED DEPOSITION PROCESSES
Authors: SIEMROTH P WITKE T SCHULKE T LENK A
Citation: P. Siemroth et al., SHORT-TIME INVESTIGATION OF LASER AND ARC-ASSISTED DEPOSITION PROCESSES, Surface & coatings technology, 68, 1994, pp. 713-718
Risultati: 1-9 |