Authors:
SUGAI K
KISHIDA S
SHINZAWA T
OKABAYASHI H
YAKO T
KADOKURA H
ISEMURA M
KOBAYASHI T
HOSOKAWA N
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Authors:
SHINZAWA T
SUGAI K
HAYASHI Y
NAKAJIMA T
KISHIDA S
OKABAYASHI H
TSUNENARI K
MURAO Y
KOBAYASHI A
Citation: T. Shinzawa et al., BARRIER LAYERLESS SUBMICRON ALUMINUM-DAMASCENE INTERCONNECTION USING ALUMINUM CHEMICAL-VAPOR-DEPOSITION WITH A NEW NUCLEATION METHOD, Electronics & communications in Japan. Part 2, Electronics, 79(5), 1996, pp. 88-96
Authors:
SUGAI K
OKABAYASHI H
KISHIDA S
SHINZAWA T
Citation: K. Sugai et al., TITANIUM-CONTAINING HYDROFLUORIC-ACID PRETREATMENT FOR ALUMINUM CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 280(1-2), 1996, pp. 142-146
Authors:
KOBAYASHI A
SEKIGUCHI A
OKADA O
HOSOKAWA N
SUGAI K
KISHIDA S
OKABAYASHI H
SHINZAWA T
YAKO T
KADOKURA H
Citation: A. Kobayashi et al., GROWTH-PROCESS OF THIN CHEMICAL-VAPOR DEPOSITION-ALUMINUM FILMS AND ITS UNDERLAYER DEPENDENCE - REAL-TIME MONITORING OF REFLECTED LIGHT-INTENSITY AT THE DEPOSITING SURFACE, Electronics & communications in Japan. Part 2, Electronics, 78(12), 1995, pp. 50-58
Authors:
SUGAI K
OKABAYASHI H
SHINZAWA T
KISHIDA S
KOBAYASHI A
YAKO T
KADOKURA H
Citation: K. Sugai et al., ALUMINUM CHEMICAL-VAPOR-DEPOSITION WITH NEW GAS-PHASE PRETREATMENT USING TETRAKISDIMETHYLAMINO-TITANIUM FOR ULTRALARGE-SCALE INTEGRATED-CIRCUIT METALLIZATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(5), 1995, pp. 2115-2118
Authors:
ISHIWATA T
SHINZAWA T
SI JH
OBI K
TANAKA I
Citation: T. Ishiwata et al., OPTICAL OPTICAL DOUBLE-RESONANCE SPECTROSCOPY OF CL2 - ANALYSES OF THE 0U-3(2)) ION-PAIR STATES(, 1U, AND 2U(P), Journal of molecular spectroscopy, 166(2), 1994, pp. 321-337