Authors:
SHMAENOK L
BIJKERK F
LOUIS E
VANHONK A
VANDERWIEL MJ
PLATONOV Y
SHEVELKO A
MITROFANOV A
FROWEIN H
NICOLAUS B
VOSS F
DESOR R
Citation: L. Shmaenok et al., ISSUES OF LASER-PLASMA SOURCES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 211-214
Authors:
LOUIS E
VOORMA HJ
KOSTER NB
SHMAENOK L
BIJKERK F
SCHLATMANN R
VERHOEVEN J
PLATONOV YY
VANDORSSEN GE
PADMORE HA
Citation: E. Louis et al., ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT, Microelectronic engineering, 23(1-4), 1994, pp. 215-218
Authors:
LOUIS E
BIJKERK F
SHMAENOK L
VOORMA HJ
VANDERWIEL MJ
SCHLATMANN R
VERHOEVEN J
VANDERDRIFT EWJM
ROMIJN J
ROUSSEEUW BAC
VOSS F
DESOR R
NIKOLAUS B
Citation: E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70