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Results:
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Results: 10
MEASUREMENTS OF ELECTRON-IMPACT IONIZATION CROSS-SECTIONS OF NEON BY COMPARISON WITH PHOTOIONIZATION
Authors:
SOROKIN AA
SHMAENOK LA
BOBASHEV SV
MOBUS B
ULM G
Citation: Aa. Sorokin et al., MEASUREMENTS OF ELECTRON-IMPACT IONIZATION CROSS-SECTIONS OF NEON BY COMPARISON WITH PHOTOIONIZATION, Physical review. A, 58(4), 1998, pp. 2900-2910
Authors:
SHEVELKO AP
SHMAENOK LA
CHURILOV SS
BASTIAENSEN RKFJ
BIJKERK F
Citation: Ap. Shevelko et al., EXTREME-ULTRAVIOLET SPECTROSCOPY OF A LASER-PLASMA SOURCE FOR LITHOGRAPHY, Physica scripta. T, 57(2), 1998, pp. 276-282
Authors:
SHMAENOK LA
PLATONOV YY
SALASHCHENKO NN
SOROKIN AA
SIMANOVSKII DM
GOLUBEV AV
BELIK VP
BOBASHEV SV
BIJKERK F
LOUIS E
MEIJER FG
ETLICHER B
GRUDSKY AY
Citation: La. Shmaenok et al., MULTILAYER EUV X-RAY POLYCHROMATORS FOR PLASMA DIAGNOSTICS/, Journal of electron spectroscopy and related phenomena, 80, 1996, pp. 259-262
Authors:
SOROKIN AA
SHMAENOK LA
BELIK VP
BOBASHEV SV
ETLISHER B
ATELAN S
BAIOL F
Citation: Aa. Sorokin et al., SOFT-X-RAY RADIATION OF DENSE-PLASMA IN T HE EXPLODING WIRE CONFIGURATION IN PLASMA-JET, Pis'ma v Zurnal tehniceskoj fiziki, 22(7), 1996, pp. 15-24
Authors:
BIJKERK F
SHMAENOK LA
LOUIS E
VOORMA HJ
KOSTER NB
BRUINEMAN C
BASTIAENSEN RKFJ
VANDERDRIFT EWJM
ROMIJN J
DEGROOT LEM
ROUSSEEUW BAC
ZIJLSTRA T
PLATONOV YY
SALASHCHENKO NN
Citation: F. Bijkerk et al., EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS, Microelectronic engineering, 30(1-4), 1996, pp. 183-186
Authors:
SIMANOVSKII DM
GLADSKIKH AN
SHMAENOK LA
BOBASHEV SV
Citation: Dm. Simanovskii et al., DEMONSTRATION OF LASER-INDUCED X-RAY GENERATION IN AN EXPANDING LASER-PRODUCED PLASMA, Physical review letters, 77(5), 1996, pp. 849-852
Authors:
SHMAENOK LA
SIMANOVSKII DM
GLADSKIKH AN
BOBASHEV SV
Citation: La. Shmaenok et al., STUDY OF SOFT-X-RAY EMISSION OF LASER-PLA SMA DEVELOPED BY 2 CONSECUTIVE LASER-PULSES, Pis'ma v Zurnal tehniceskoj fiziki, 21(22), 1995, pp. 35-40
Authors:
BIJKERK F
SHMAENOK LA
SHEVELKO AP
BASTIAENSEN RKFJ
BRUINEMAN C
VANHONK AGJR
Citation: F. Bijkerk et al., A HIGH-POWER, LOW-CONTAMINATION LASER-PLASMA SOURCE FOR EXTREME UV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 299-301
Authors:
BOBASHEV SV
GOLUBEV AV
MOSESYAN DA
PLATONOV YY
SALASHCHENKO NN
SIMANOVSKII DM
SOROKIN AA
SHMAENOK LA
Citation: Sv. Bobashev et al., FOCUSING OF SOFT-X-RAY EMISSION OF LASER- PLASMA SOURCES USING MULTILAYERED MIRRORS, Zurnal tehniceskoj fiziki, 65(10), 1995, pp. 62-73
Authors:
BOBASHEV SV
MOSESYAN DA
SIMANOVSKII DM
SHMAENOK LA
Citation: Sv. Bobashev et al., DIAGNOSTICS OF SCATTERING LASER-PLASMA BY THE TOMPSON SCATTERING TECHNIQUE, Pis'ma v Zurnal tehniceskoj fiziki, 19(5), 1993, pp. 14-18
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