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Results:
1-8
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Results: 8
Authors:
FALK F
MOLLEKOPF G
STAFAST H
Citation: F. Falk et al., CO2-LASER CVD OF A-SI-H - IN-SITU GAS-ANALYSIS AND MODEL-CALCULATIONS, Applied physics A: Materials science & processing, 67(5), 1998, pp. 507-512
Authors:
DIEGEL M
FALK F
HERGT R
HOBERT H
STAFAST H
Citation: M. Diegel et al., CRYSTALLINE SIC THIN-FILM DEPOSITION BY LASER-ABLATION - INFLUENCE OFLASER-SURFACE ACTIVATION, Applied physics A: Materials science & processing, 66(2), 1998, pp. 183-187
Authors:
ANDRA G
BERGMANN J
FALK F
OSE E
STAFAST H
Citation: G. Andra et al., LASER-INDUCED CRYSTALLIZATION OF AMORPHOUS-SILICON FILMS ON GLASS FORTHIN-FILM SOLAR-CELLS, Physica status solidi. a, Applied research, 166(2), 1998, pp. 629-634
Authors:
FALK F
MEINSCHIEN J
SCHUSTER K
STAFAST H
Citation: F. Falk et al., PROPERTIES AND PREPARATION CONDITIONS OF CARBON NITRIDE THIN-FILMS DEPOSITED BY LASER CVD, Carbon (New York), 36(5-6), 1998, pp. 765-769
Authors:
FALK F
MEINSCHIEN J
MOLLEKOPF G
SCHUSTER K
STAFAST H
Citation: F. Falk et al., CNX THIN-FILMS PREPARED BY LASER-CHEMICAL VAPOR-DEPOSITION, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 89-91
Authors:
STAFAST H
REDLICH L
KOHLER T
STEENBECK K
DIEGEL M
Citation: H. Stafast et al., LASER-SURFACE INTERACTION DURING AND AFTER DEPOSITION OF THIN OXIDE-FILMS, Applied surface science, 106, 1996, pp. 335-340
Authors:
BARTH M
HESS P
MOLLEKOPF G
STAFAST H
Citation: M. Barth et al., SF6 SENSITIZED CO2-LASER CHEMICAL-VAPOR-DEPOSITION OF A-GE-H, Thin solid films, 241(1-2), 1994, pp. 61-66
Authors:
GOLUSDA E
HESSENTHALER P
MOLLEKOPF G
STAFAST H
Citation: E. Golusda et al., SF6 SENSITIZED CO2-LASER CVD OF AMORPHOUS-SILICON, Applied surface science, 69(1-4), 1993, pp. 258-261
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