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LIU J
ZHIRNOV VV
MYERS AF
WOJAK GJ
CHOI WB
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WOLTER SD
MCCLURE MT
STONER BR
GLASS JT
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Authors:
TUCKER DA
SEO DK
WHANGBO MH
SIVAZLIAN FR
STONER BR
BOZEMAN SP
SOWERS AT
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GLASS JT
Citation: Da. Tucker et al., COMPARISON OF SILICON, NICKEL, AND NICKEL SILICIDE (NI3SI) AS SUBSTRATES FOR EPITAXIAL DIAMOND GROWTH, Surface science, 334(1-3), 1995, pp. 179-194
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Authors:
BOZEMAN SP
TUCKER DA
STONER BR
GLASS JT
HOOKE WM
Citation: Sp. Bozeman et al., DIAMOND DEPOSITION USING A PLANAR RADIO-FREQUENCY INDUCTIVELY-COUPLEDPLASMA, Applied physics letters, 66(26), 1995, pp. 3579-3581
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Citation: Sd. Wolter et al., THE EFFECT OF SUBSTRATE MATERIAL ON BIAS-ENHANCED DIAMOND NUCLEATION, DIAMOND AND RELATED MATERIALS, 3(9), 1994, pp. 1188-1195
Authors:
FOX BA
STONER BR
MALTA DM
ELLIS PJ
GLASS RC
SIVAZLIAN FR
Citation: Ba. Fox et al., EPITAXIAL NUCLEATION, GROWTH AND CHARACTERIZATION OF HIGHLY ORIENTED,(100)-TEXTURED DIAMOND FILMS ON SILICON, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 382-387
Citation: Fr. Sivazlian et al., INVESTIGATION OF THE LOW-ANGLE GRAIN-BOUNDARIES IN HIGHLY ORIENTED DIAMOND FILMS VIA TRANSMISSION ELECTRON-MICROSCOPY, Journal of materials research, 9(10), 1994, pp. 2487-2489
Authors:
EVERSON MP
TAMOR MA
SCHOLL D
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BADE JP
Citation: Mp. Everson et al., POSITIVE IDENTIFICATION OF THE UBIQUITOUS TRIANGULAR DEFECT ON THE (100) FACES OF VAPOR-GROWN DIAMOND, Journal of applied physics, 75(1), 1994, pp. 169-172
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Authors:
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SAHAIDA SR
BADE JP
SOUTHWORTH P
ELLIS PJ
Citation: Br. Stoner et al., HIGHLY ORIENTED, TEXTURED DIAMOND FILMS ON SILICON VIA BIAS-ENHANCED NUCLEATION AND TEXTURED GROWTH, Journal of materials research, 8(6), 1993, pp. 1334-1340
Authors:
BERGMAN L
STONER BR
TURNER KF
GLASS JT
NEMANICH RJ
Citation: L. Bergman et al., MICROPHOTOLUMINESCENCE AND RAMAN-SCATTERING STUDY OF DEFECT FORMATIONIN DIAMOND FILMS, Journal of applied physics, 73(8), 1993, pp. 3951-3957
Citation: Br. Stoner et al., HALL-EFFECT MEASUREMENTS ON BORON-DOPED, HIGHLY ORIENTED DIAMOND FILMS GROWN ON SILICON VIA MICROWAVE PLASMA CHEMICAL-VAPOR DEPOSITION, Applied physics letters, 62(19), 1993, pp. 2347-2349