Authors: Sedky, S Witvrouw, A Saerens, A Van Houtte, P Poortmans, J Baert, K

Citation: S. Sedky et al., Effect of in situ boron doping on properties of silicon germanium films deposited by chemical vapor deposition at 400 degrees C, J MATER RES, 16(9), 2001, pp. 2607-2612

Authors: Saerens, A Van Houtte, P Kalidindi, SR

Citation: A. Saerens et al., Finite element modeling of microscale thermal residual stresses in Al interconnects, J MATER RES, 16(4), 2001, pp. 1112-1122

Authors: Heyvaert, I Van Hove, M Witvrouw, A Maex, K Saerens, A Roussel, P Bender, H

Citation: I. Heyvaert et al., Effect of oxide and W-CMP on the material properties and electromigration behaviour of layered aluminum metallisations, MICROEL ENG, 50(1-4), 2000, pp. 291-299

Authors: Lagrange, S Brongersma, SH Judelewicz, M Saerens, A Vervoort, I Richard, E Palmans, R Maex, K

Citation: S. Lagrange et al., Self-annealing characterization of electroplated copper films, MICROEL ENG, 50(1-4), 2000, pp. 449-457

Authors: Saerens, A Van Houtte, P Meert, B Quaeyhaegens, C

Citation: A. Saerens et al., Assessment of different X-ray stress measuring techniques for thin titanium nitride coatings, J APPL CRYS, 33, 2000, pp. 312-322