Authors: Polignano, ML Alessandri, M Crivelli, B Zonca, R Caricato, AP Bersani, M Sbetti, M Vanzetti, L

Citation: Ml. Polignano et al., The impact of the nitridation process on the properties of the Si-SiO2 interface, J NON-CRYST, 280(1-3), 2001, pp. 39-47

Authors: Vanzetti, L Bersani, M Sbetti, M Anderle, M

Citation: L. Vanzetti et al., XPS and SIMS depth profiling of oxynitrides, SURF INT AN, 30(1), 2000, pp. 255-259

Authors: Solmi, S Bersani, M Sbetti, M Hansen, JL Larsen, AN

Citation: S. Solmi et al., Boron-interstitial silicon clusters and their effects on transient enhanced diffusion of boron in silicon, J APPL PHYS, 88(8), 2000, pp. 4547-4552

Authors: Bersani, M Vanzetti, L Sbetti, M Anderle, M

Citation: M. Bersani et al., Characterization of rapid thermal processing oxynitrides by SIMS and XPS analyses, APPL SURF S, 145, 1999, pp. 301-305