Authors:
Han, XH
Cao, GZ
Pratum, T
Schwartz, DT
Lutz, B
Citation: Xh. Han et al., Synthesis and properties of Er3+-doped silica glass by sol-gel processing with organic complexation, J MATER SCI, 36(4), 2001, pp. 985-993
Citation: Wh. Wang et al., Rapid prototyping of masks for through-mask electrodeposition of thick metallic components, J ELCHEM SO, 148(5), 2001, pp. C363-C368
Authors:
O'Regan, B
Schwartz, DT
Zakeeruddin, SM
Gratzel, M
Citation: B. O'Regan et al., Electrodeposited nanocomposite n-p heterojunctions for solid-state dye-sensitized photovoltaics, ADVAN MATER, 12(17), 2000, pp. 1263
Citation: Dt. Schwartz et Sm. Haight, Transport and chemistry at electroactive interfaces studied using line-imaging Raman spectroscopy, COLL SURF A, 174(1-2), 2000, pp. 209-219
Citation: Km. Jeerage et Dt. Schwartz, Characterization of cathodically deposited nickel hexacyanoferrate for electrochemically switched ion exchange, SEP SCI TEC, 35(15), 2000, pp. 2375-2392
Citation: Sd. Leith et Dt. Schwartz, High-rate through-mold electrodeposition of thick (> 200 mu m) NiFe MEMS components with uniform composition, J MICROEL S, 8(4), 1999, pp. 384-392
Citation: Sd. Leith et Dt. Schwartz, In-situ fabrication of sacrificial layers in electrodeposited NiFe microstructures, J MICROM M, 9(1), 1999, pp. 97-104
Citation: Sd. Leith et Dt. Schwartz, Through-mold electrodeposition using the uniform injection cell (UIC): Workpiece and pattern scale uniformity, ELECTR ACT, 44(23), 1999, pp. 4017-4027
Citation: Sm. Haight et al., In situ oxidation state profiling of nickel hexacyanoferrate derivatized electrodes using line-imaging Raman spectroscopy and multivariate calibration, J ELCHEM SO, 146(5), 1999, pp. 1866-1872
Citation: Sd. Leith et al., Characterization of NixFe1-x(0.10 < x < 0.95) electrodeposition from a family of sulfamate-chloride electrolytes, J ELCHEM SO, 146(4), 1999, pp. 1431-1435