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Results: 1-12 |
Results: 12
Estimating pre-exponential factors for desorption from semiconductors: consequences for a priori process modeling
Authors: Wang, Z Seebauer, EG
Citation: Z. Wang et Eg. Seebauer, Estimating pre-exponential factors for desorption from semiconductors: consequences for a priori process modeling, APPL SURF S, 181(1-2), 2001, pp. 111-120
Semiconductor surface diffusion: Effects of low-energy ion bombardment - art. no. 125317
Authors: Ditchfeld, R Seebauer, EG
Citation: R. Ditchfeld et Eg. Seebauer, Semiconductor surface diffusion: Effects of low-energy ion bombardment - art. no. 125317, PHYS REV B, 6312(12), 2001, pp. 5317
Surface diffusion kinetics on amorphous silicon
Authors: Dalton, AS Llera-Hurlburt, D Seebauer, EG
Citation: As. Dalton et al., Surface diffusion kinetics on amorphous silicon, SURF SCI, 494(1), 2001, pp. L761-L766
Arsenic redistribution during rapid thermal chemical vapor deposition of TiSi2 on Si
Authors: Fang, H Ozturk, MC O'Neil, PA Seebauer, EG
Citation: H. Fang et al., Arsenic redistribution during rapid thermal chemical vapor deposition of TiSi2 on Si, J ELCHEM SO, 148(2), 2001, pp. G43-G49
When do you blow the whistle?
Authors: Seebauer, EG
Citation: Eg. Seebauer, When do you blow the whistle?, CHEM ENG, 108(4), 2001, pp. 123-126
Reactions of ethanol over metal oxides
Authors: Idriss, H Seebauer, EG
Citation: H. Idriss et Eg. Seebauer, Reactions of ethanol over metal oxides, J MOL CAT A, 152(1-2), 2000, pp. 201-212
Effect of oxygen electronic polarisability on catalytic reactions over oxides
Authors: Idriss, H Seebauer, EG
Citation: H. Idriss et Eg. Seebauer, Effect of oxygen electronic polarisability on catalytic reactions over oxides, CATAL LETT, 66(3), 2000, pp. 139-145
Semiconductor surface diffusion: Nonthermal effects of photon illumination
Authors: Ditchfield, R Llera-Rodriguez, D Seebauer, EG
Citation: R. Ditchfield et al., Semiconductor surface diffusion: Nonthermal effects of photon illumination, PHYS REV B, 61(20), 2000, pp. 13710-13720
Manipulating photoadsorption kinetics: NO on Cl-treated Fe2O3
Authors: Blomiley, ER Seebauer, EG
Citation: Er. Blomiley et Eg. Seebauer, Manipulating photoadsorption kinetics: NO on Cl-treated Fe2O3, J PHYS CH B, 103(24), 1999, pp. 5035-5041
New approach to manipulating and characterizing powdered photoadsorbents: NO on Cl-treated Fe2O3
Authors: Blomiley, ER Seebauer, EG
Citation: Er. Blomiley et Eg. Seebauer, New approach to manipulating and characterizing powdered photoadsorbents: NO on Cl-treated Fe2O3, LANGMUIR, 15(18), 1999, pp. 5970-5976
Direct measurement of ion-influenced surface diffusion
Authors: Ditchfield, R Seebauer, EG
Citation: R. Ditchfield et Eg. Seebauer, Direct measurement of ion-influenced surface diffusion, PHYS REV L, 82(6), 1999, pp. 1185-1188
Effects of arsenic doping on chemical vapor deposition of titanium silicide
Authors: Fang, H Ozturk, MC Seebauer, EG Batchelor, DE
Citation: H. Fang et al., Effects of arsenic doping on chemical vapor deposition of titanium silicide, J ELCHEM SO, 146(11), 1999, pp. 4240-4245
Risultati: 1-12 |