Authors:
Senez, V
Herbaux, J
Hoffmann, T
Lampin, E
Citation: V. Senez et al., 3-dimensional process simulation of thermal annealing of low dose implanted dopants in silicon, IEICE TR EL, E83C(8), 2000, pp. 1267-1274
Citation: V. Senez et al., Calibration of a two-dimensional numerical model for the optimization of LOGOS-type isolations by response surface methodology, IEEE SEMIC, 13(4), 2000, pp. 416-426
Authors:
Legrand, B
Agache, V
Nys, JP
Senez, V
Stievenard, D
Citation: B. Legrand et al., Formation of silicon islands on a silicon on insulator substrate upon thermal annealing, APPL PHYS L, 76(22), 2000, pp. 3271-3273
Citation: T. Hoffmann et al., Finite-element calculations of mechanical stresses induced by water adsorption/desorption in silicate glasses, J VAC SCI B, 17(6), 1999, pp. 2603-2609
Citation: E. Lampin et al., Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon, J APPL PHYS, 85(12), 1999, pp. 8137-8144