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Results: 1-3 |
Results: 3
Development of a locally electron-heated plasma source
Authors: Seki, H Kitazawa, S Ueno, Y Wada, N Takemori, S Sato, T Uchikawa, S Setoyama, E
Citation: H. Seki et al., Development of a locally electron-heated plasma source, VACUUM, 59(2-3), 2000, pp. 445-450
Development of a locally-electron-heated plasma source for HDP-CVD process
Authors: Seki, H Ueno, Y Ichimura, S Takemori, S Uchikawa, S Murakamia, H Okada, S Mochizuki, Y Setoyama, E
Citation: H. Seki et al., Development of a locally-electron-heated plasma source for HDP-CVD process, VACUUM, 51(4), 1998, pp. 695-697
Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550 x 650 mm) substrates
Authors: Nakajima, K Onisawa, K Chahara, K Minemura, T Kamei, M Setoyama, E
Citation: K. Nakajima et al., Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550 x 650 mm) substrates, VACUUM, 51(4), 1998, pp. 761-764
Risultati: 1-3 |