Citation: Yq. Fu et al., Characterization of focused ion beam induced deposition process and parameters calibration, SENS ACTU-A, 88(1), 2001, pp. 58-66
Citation: Yq. Fu et al., Investigation of submicron linewidth direct deposition for high-density ICchip modification by focused ion beam, INT J ADV M, 17(11), 2001, pp. 835-839
Citation: Yq. Fu et al., Diffractive optical elements with continuous relief fabricated by focused ion beam for monomode fiber coupling, OPT EXPRESS, 7(3), 2000, pp. 141-147
Citation: Yq. Fu et al., Influence of the redeposition effect for focused ion beam 3D micromachining in silicon, INT J ADV M, 16(12), 2000, pp. 877-880
Citation: Yq. Fu et al., Microfabrication of diffractive optical element with continuous relief by focused ion beam, MICROEL ENG, 54(3-4), 2000, pp. 287-293
Authors:
Fu, YQ
Kok, N
Bryan, A
Hung, NP
Shing, ON
Citation: Yq. Fu et al., Experimental study of three-dimensional microfabrication by focused ion beam technology, REV SCI INS, 71(2), 2000, pp. 1006-1008
Citation: Yq. Fu et al., Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etching, REV SCI INS, 71(2), 2000, pp. 1009-1011