AAAAAA

   
Results: 1-14 |
Results: 14
Effects of reflow processing and flux residue on ionic migration of lead-free solder plating using the quartz crystal microbalance method
Authors: Tanaka, H Ueta, F Yoshihara, S Shirakashi, T
Citation: H. Tanaka et al., Effects of reflow processing and flux residue on ionic migration of lead-free solder plating using the quartz crystal microbalance method, MATER TRANS, 42(9), 2001, pp. 2003-2007
Improvement of the photocatalytic activity of titanium oxide by X-ray irradiation
Authors: Iimura, S Teduka, H Nakagawa, A Yoshihara, S Shirakashi, T
Citation: S. Iimura et al., Improvement of the photocatalytic activity of titanium oxide by X-ray irradiation, ELECTROCH, 69(5), 2001, pp. 324-328
Scratching test of hard-brittle materials under high hydrostatic pressure
Authors: Yoshino, M Aoki, T Shirakashi, T
Citation: M. Yoshino et al., Scratching test of hard-brittle materials under high hydrostatic pressure, J MANUF SCI, 123(2), 2001, pp. 231-239
On the ductile machining of silicon for micro electro-mechanical systems (MEMS), opto-electronic and optical applications
Authors: Yan, J Yoshino, M Kuriagawa, T Shirakashi, T Syoji, K Komanduri, R
Citation: J. Yan et al., On the ductile machining of silicon for micro electro-mechanical systems (MEMS), opto-electronic and optical applications, MAT SCI E A, 297(1-2), 2001, pp. 230-234
Finite element simulation of plane strain plastic-elastic indentation on single-crystal silicon
Authors: Yoshino, M Aoki, T Chandrasekaran, N Shirakashi, T Komanduri, R
Citation: M. Yoshino et al., Finite element simulation of plane strain plastic-elastic indentation on single-crystal silicon, INT J MECH, 43(2), 2001, pp. 313-333
Some experiments on the scratching of silicon: In situ scratching inside an SEM and scratching under high external hydrostatic pressures
Authors: Yoshino, M Aoki, T Shirakashi, T Komanduri, R
Citation: M. Yoshino et al., Some experiments on the scratching of silicon: In situ scratching inside an SEM and scratching under high external hydrostatic pressures, INT J MECH, 43(2), 2001, pp. 335-347
Copper electrodeposition on B-terminated or O-terminated boron-doped diamond electrode
Authors: Kittaka, Y Ito, M Yoshihara, S Shirakashi, T Hashimoto, K Tryk, DA Fujishima, A
Citation: Y. Kittaka et al., Copper electrodeposition on B-terminated or O-terminated boron-doped diamond electrode, ELECTROCH, 68(12), 2000, pp. 972-976
Flow stress equation with effect of strain-rate and temperature histories under processing
Authors: Shirakashi, T Yoshino, M
Citation: T. Shirakashi et M. Yoshino, Flow stress equation with effect of strain-rate and temperature histories under processing, J PHYS IV, 10(P9), 2000, pp. 137-142
Nature of the photographic diamond surface phenomenon on boron-doped diamond
Authors: Yoshihara, S Shinozaki, K Zenbayashi, T Morino, S Shirakashi, T Hashimoto, K Tryk, DA Fujishima, A
Citation: S. Yoshihara et al., Nature of the photographic diamond surface phenomenon on boron-doped diamond, ELECTR ACT, 45(20), 2000, pp. 3375-3378
Effects of chemical speciation and light irradiation on the volatilizationof mercury by Chlorella sp.
Authors: Yamamoto, S Kakii, K Nikata, T Kuriyama, M Shirakashi, T
Citation: S. Yamamoto et al., Effects of chemical speciation and light irradiation on the volatilizationof mercury by Chlorella sp., SEIBUTSU-K, 77(6), 1999, pp. 213-218
Adsorption of HgBrn complexes on activated carbon
Authors: Shirakashi, T Tanaka, K Tamura, T Yosihara, S
Citation: T. Shirakashi et al., Adsorption of HgBrn complexes on activated carbon, NIP KAG KAI, (2), 1999, pp. 137-143
Photoelectrodeposition of copper on boron-doped diamond films: applicationto conductive pattern formation on diamond. The photographic diamond surface phenomenon
Authors: Yoshihara, S Shinozaki, K Shirakashi, T Hashimoto, K Tryk, DA Fujishima, A
Citation: S. Yoshihara et al., Photoelectrodeposition of copper on boron-doped diamond films: applicationto conductive pattern formation on diamond. The photographic diamond surface phenomenon, ELECTR ACT, 44(16), 1999, pp. 2711-2719
Determination of ultratrace indium in water sample by electrothermal atomic absorption spectrometry after preconcentration with solvent extraction and back extraction
Authors: Kawaguchi, H Okamoto, T Miura, K Shimizu, T Shirakashi, T
Citation: H. Kawaguchi et al., Determination of ultratrace indium in water sample by electrothermal atomic absorption spectrometry after preconcentration with solvent extraction and back extraction, B CHEM S J, 72(11), 1999, pp. 2445-2449
Recent progress and some difficulties in computational modeling of machining
Authors: Shirakashi, T Obikawa, T
Citation: T. Shirakashi et T. Obikawa, Recent progress and some difficulties in computational modeling of machining, MACH SCI T, 2(2), 1998, pp. 277-301
Risultati: 1-14 |