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Authors:
Sinno, T
Susanto, H
Brown, RA
von Ammon, W
Dornberger, E
Citation: T. Sinno et al., Boron retarded self-interstitial diffusion in Czochralski growth of silicon crystals and its role in oxidation-induced stacking-fault ring dynamics, APPL PHYS L, 75(11), 1999, pp. 1544-1546