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Results: 1-8 |
Results: 8
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment
Authors: Volland, B Shi, F Heerlein, H Rangelow, IW Hudek, P Kostic, I Cekan, E Vonach, H Loeschner, H Horner, C Stengl, G Buschbeck, H Zeininger, M Bleeker, A Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206
Experimental evaluation of an optimized radiation cooling geometry for ionprojection lithography masks
Authors: Torres, JL Nounu, HN Wasson, JR Wolfe, JC Lutz, J Haugeneder, E Loschner, H Stengl, G Kaesmaier, R
Citation: Jl. Torres et al., Experimental evaluation of an optimized radiation cooling geometry for ionprojection lithography masks, J VAC SCI B, 18(6), 2000, pp. 3207-3209
Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography
Authors: de Jager, PWH Mertens, B Munro, E Cekan, E Lammer, G Vonach, H Buschbeck, H Zeininger, M Horner, C Loschner, H Stengl, G Bleeker, AJ
Citation: Pwh. De Jager et al., Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 617-620
Ion projection lithography: International development program
Authors: Kaesmaier, R Loschner, H Stengl, G Wolfe, JC Ruchhoeft, P
Citation: R. Kaesmaier et al., Ion projection lithography: International development program, J VAC SCI B, 17(6), 1999, pp. 3091-3097
Experimental results of the stochastic Coulomb interaction in ion projection lithography
Authors: de Jager, PWH Derksen, G Mertens, B Cekan, E Lammer, G Vonach, H Buschbeck, H Zeininger, M Horner, C Loschner, H Stengl, G Bleeker, AJ Benschop, J Shi, F Volland, B Hudek, P Heerlein, H Rangelow, IW Kaesmaier, R
Citation: Pwh. De Jager et al., Experimental results of the stochastic Coulomb interaction in ion projection lithography, J VAC SCI B, 17(6), 1999, pp. 3098-3106
Resolution improvement of ion projector with a low energy spread multicuspion source
Authors: Bruenger, WH Torkler, M Leung, KN Lee, Y Williams, MD Loeschner, H Stengl, G Fallmann, W Paschke, F Stangl, G Rangelow, IW Hudek, P
Citation: Wh. Bruenger et al., Resolution improvement of ion projector with a low energy spread multicuspion source, MICROEL ENG, 46(1-4), 1999, pp. 477-480
Ion projection lithography: Status of the MEDEA project and United States European cooperation
Authors: Gross, G Kaesmaier, R Loschner, H Stengl, G
Citation: G. Gross et al., Ion projection lithography: Status of the MEDEA project and United States European cooperation, J VAC SCI B, 16(6), 1998, pp. 3150-3153
Optimization of the temperature distribution across stencil mask membranesunder ion beam exposure
Authors: Kim, B Engelstad, R Lovell, E Chalupka, A Haugeneder, E Lammer, G Loschner, H Lutz, J Stengl, G
Citation: B. Kim et al., Optimization of the temperature distribution across stencil mask membranesunder ion beam exposure, J VAC SCI B, 16(6), 1998, pp. 3602-3605
Risultati: 1-8 |