AAAAAA

   
Results: 1-10 |
Results: 10
Plasma chemistry and surface processes of negative ions
Authors: Stoffels, E Stoffels, WW Kroesen, GMW
Citation: E. Stoffels et al., Plasma chemistry and surface processes of negative ions, PLASMA SOUR, 10(2), 2001, pp. 311-317
Micro-disperse particles in plasmas: From disturbing side effects to new applications
Authors: Kersten, H Deutsch, H Stoffels, E Stoffels, WW Kroesen, GMW Hippler, R
Citation: H. Kersten et al., Micro-disperse particles in plasmas: From disturbing side effects to new applications, CONTR PLASM, 41(6), 2001, pp. 598-609
Near-surface generation of negative ions in low-pressure discharges
Authors: Stoffels, E Stoffels, WW Kroutilina, VM Wagner, HE Meichsner, J
Citation: E. Stoffels et al., Near-surface generation of negative ions in low-pressure discharges, J VAC SCI A, 19(5), 2001, pp. 2109-2115
Surface processes of dust particles in low pressure plasmas
Authors: Stoffels, E Stoffels, WW Kersten, H Swinkels, GHPM Kroesen, GMW
Citation: E. Stoffels et al., Surface processes of dust particles in low pressure plasmas, PHYS SCR, T89, 2001, pp. 168-172
Formation and deposition of MoS2-nanoparticles
Authors: Keune, H Lacom, W Rossi, F Stoffels, E Stoffels, WW Wahl, G
Citation: H. Keune et al., Formation and deposition of MoS2-nanoparticles, J PHYS IV, 10(P2), 2000, pp. 19-26
Investigations on the energy influx at plasma surface processes
Authors: Kersten, H Rohde, D Deutsch, H Hippler, R Stoffels, WW Stoffels, E Kroesen, GMW Berndt, J
Citation: H. Kersten et al., Investigations on the energy influx at plasma surface processes, ACT PHYS SL, 50(4), 2000, pp. 439-459
Energy influx from an rf plasma to a substrate during plasma processing
Authors: Kersten, H Stoffels, E Stoffels, WW Otte, M Csambal, C Deutsch, H Hippler, R
Citation: H. Kersten et al., Energy influx from an rf plasma to a substrate during plasma processing, J APPL PHYS, 87(8), 2000, pp. 3637-3645
Etching a single micrometer-size particle in a plasma
Authors: Stoffels, WW Stoffels, E Swinkels, GHPM Boufnichel, M Kroesen, GMW
Citation: Ww. Stoffels et al., Etching a single micrometer-size particle in a plasma, PHYS REV E, 59(2), 1999, pp. 2302-2304
Laser-induced particle formation and coalescence in a methane discharge
Authors: Stoffels, WW Stoffels, E Ceccone, G Rossi, F
Citation: Ww. Stoffels et al., Laser-induced particle formation and coalescence in a methane discharge, J VAC SCI A, 17(6), 1999, pp. 3385-3392
MoS2 nanoparticle formation in a low pressure environment
Authors: Stoffels, E Stoffels, WW Ceccone, G Hasnaoui, R Keune, H Wahl, G Rossi, F
Citation: E. Stoffels et al., MoS2 nanoparticle formation in a low pressure environment, J APPL PHYS, 86(6), 1999, pp. 3442-3451
Risultati: 1-10 |