Authors:
Lee, JH
Lee, JH
Hwang, KJ
Kim, JY
Suk, CG
Choi, SY
Citation: Jh. Lee et al., Effects of hydrogen plasma pretreatment on characteristics of copper film deposited by remote plasma CVD using (hfac)Cu(TMVS), THIN SOL FI, 375(1-2), 2000, pp. 132-136
Authors:
Lee, JM
Kang, SY
Shin, JC
Hwang, CS
Kim, HJ
Suk, CG
Citation: Jm. Lee et al., Characterization of RuO2 electrodes for ferroelectric thin films prepared by metal-organic chemical-vapor deposition using Ru(C11H19O2)(3), J KOR PHYS, 35, 1999, pp. S107-S109
Authors:
Lee, JM
Hong, SK
Hwang, CS
Kim, HJ
Suk, CG
Citation: Jm. Lee et al., Characterization of Pt electrodes for ferroelectric thin films prepared bymetallorganic chemical vapor deposition using Pt(CF3COCHCOCF3)(2) and (CH3C5H4)Pt(CH3)(3), J KOR PHYS, 33, 1998, pp. S148-S151