Authors: Kirillov, YV Sitanov, DV Svettsov, VI

Citation: Yv. Kirillov et al., The role of ions and UV radiation in gallium arsenide etching process, HIGH ENERG, 34(5), 2000, pp. 326-330

Authors: Skorodumov, AE Sitanov, DV Svettsov, VI

Citation: Ae. Skorodumov et al., Use of optical emission spectroscopy for determining the number concentration of chlorine atoms in a chlorine-oxygen plasma, HIGH ENERG, 34(5), 2000, pp. 331-333

Authors: Kirillov, YV Sitanov, DV Svettsov, VI

Citation: Yv. Kirillov et al., Investigation of the mechanism of formation of chlorine atoms in chlorine-hydrogen plasmas, HIGH ENERG, 34(3), 2000, pp. 177-181

Authors: Sitanov, DV Svettsov, VI Efremov, AM

Citation: Dv. Sitanov et al., Mechanism of formation of atoms in chlorine-oxygen plasmas, HIGH ENERG, 33(2), 1999, pp. 110-113