Citation: Ahs. Jones et al., NOVEL HIGH WEAR-RESISTANT DIAMOND-LIKE CARBON COATINGS DEPOSITED BY MAGNETRON SPUTTERING OF CARBON TARGETS, Proceedings of the Institution of Mechanical Engineers, Part J, Journal of engineering tribology, 212(J4), 1998, pp. 301-306
Authors:
BELLIDOGONZALEZ V
HAMPSHIRE J
JONES AHS
ALLEN TJ
WITTS J
TEER DG
PIERRET B
Citation: V. Bellidogonzalez et al., ADVANCES IN THE ANALYSIS AND CHARACTERIZATION OF DLC COATINGS, Surface & coatings technology, 98(1-3), 1998, pp. 1272-1279
Authors:
BELLIDOGONZALEZ V
JONES AHS
HAMPSHIRE J
ALLEN TJ
WITTS J
TEER DG
MA KJ
UPTON D
Citation: V. Bellidogonzalez et al., TRIBOLOGICAL BEHAVIOR OF HIGH-PERFORMANCE MOS2 COATINGS PRODUCED BY MAGNETRON SPUTTERING, Surface & coatings technology, 97(1-3), 1997, pp. 687-693
Authors:
TEER DG
HAMPSHIRE J
FOX V
BELLIDOGONZALEZ V
Citation: Dg. Teer et al., THE TRIBOLOGICAL PROPERTIES OF MOS2 METAL COMPOSITE COATINGS DEPOSITED BY CLOSED FIELD MAGNETRON SPUTTERING/, Surface & coatings technology, 94-5(1-3), 1997, pp. 572-577
Authors:
MONAGHAN DP
TEER DG
LOGAN PA
EFEOGLU I
ARNELL RD
Citation: Dp. Monaghan et al., DEPOSITION OF WEAR-RESISTANT COATINGS BASED ON DIAMOND-LIKE CARBON BYUNBALANCED MAGNETRON SPUTTERING, Surface & coatings technology, 60(1-3), 1993, pp. 525-530
Authors:
MONAGHAN DP
TEER DG
LOGAN PA
LAING KC
BATES RI
ARNELL RD
Citation: Dp. Monaghan et al., AN IMPROVED METHOD FOR THE DEPOSITION OF CORROSION-RESISTANT ALUMINUMCOATINGS FOR AEROSPACE APPLICATIONS, Surface & coatings technology, 60(1-3), 1993, pp. 592-596
Citation: Dp. Monaghan et al., DEPOSITION OF GRADED ALLOY NITRIDE FILMS BY CLOSED FIELD UNBALANCED MAGNETRON SPUTTERING, Surface & coatings technology, 59(1-3), 1993, pp. 21-25
Citation: I. Efeoglu et al., THE MECHANICAL AND TRIBOLOGICAL PROPERTIES OF TITANIUM ALUMINUM NITRIDE COATINGS FORMED IN A 4 MAGNETRON CLOSED-FIELD SPUTTERING SYSTEM, Surface & coatings technology, 57(2-3), 1993, pp. 117-121
Citation: I. Efeoglu et al., THE MECHANICAL AND TRIBOLOGICAL PROPERTIES OF TITANIUM NITRIDE COATINGS FORMED IN A 4 MAGNETRON CLOSED-FIELD SPUTTERING SYSTEM, Surface & coatings technology, 57(1), 1993, pp. 61-69