Authors: LOSCHNER H STENGL G CHALUPKA A FEGERL J FISCHER R HAMMEL E LAMMER G MALEK L NOWAK R TRAHER C VONACH H WOLF P HILL RW

Citation: H. Loschner et al., PROJECTION ION-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2409-2415

Authors: LOSCHNER H STENGL G CHALUPKA A FEGERL J FISCHER R LAMMER G MALEK L NOWAK R TRAHER C WOLF P

Citation: H. Loschner et al., ION PROJECTION LITHOGRAPHY FOR VACUUM MICROELECTRONICS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(2), 1993, pp. 487-492

Authors: STENGL G BOSCH G CHALUPKA A FEGERL J FISCHER R LAMMER G LOSCHNER H MALEK L NOWAK R TRAHER C WOLF P

Citation: G. Stengl et al., ION PROJECTOR DISTORTION STABILITY AND WAFER EXPOSURES UNDER ELECTRONIC ALIGNMENT (PATTERN LOCK) CONDITIONS, Microelectronic engineering, 21(1-4), 1993, pp. 187-190

Authors: RANGELOW IW LAHR V KASSING R BLASINGBANGERT C ROTH KD BOSCH G CHALUPKA A FISCHER R LOSCHNER H NOWAK R TRAHER C STENGL G KRAUS H BAYER E

Citation: Iw. Rangelow et al., DISTORTION EVALUATION OF NICKEL STENCIL MASKS WITH THE HELP OF ION PROXIMITY EXPOSURES AND REGISTRATION MEASUREMENTS ON THE LEITZ LMS-2000, Microelectronic engineering, 21(1-4), 1993, pp. 359-362