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Results: 2
SIMULATION OF REACTIVE SPUTTERING FROM A CONCENTRIC DUAL-SOURCE MAGNETRON IN ROLL-TO-ROLL COATING PROCESSES
Authors: TSIOGAS CD AVARITSIOTIS JN
Citation: Cd. Tsiogas et Jn. Avaritsiotis, SIMULATION OF REACTIVE SPUTTERING FROM A CONCENTRIC DUAL-SOURCE MAGNETRON IN ROLL-TO-ROLL COATING PROCESSES, Vacuum, 45(4), 1994, pp. 473-481
PRACTICAL ASPECTS FOR THE USE OF PLASMA EMISSION MONITORING IN REACTIVE MAGNETRON SPUTTERING PROCESSES
Authors: TSIOGAS CD AVARITSIOTIS JN KAGARAKIS CA
Citation: Cd. Tsiogas et al., PRACTICAL ASPECTS FOR THE USE OF PLASMA EMISSION MONITORING IN REACTIVE MAGNETRON SPUTTERING PROCESSES, Vacuum, 45(12), 1994, pp. 1181-1186
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