Authors:
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Theodoropoulos, C
Salinger, AG
Mountziaris, TJ
Moffat, HK
Shadid, JN
Thrush, EJ
Citation: Rp. Pawlowski et al., Fundamental models of the metalorganic vapor-phase epitaxy of gallium nitride and their use in reactor design, J CRYST GR, 221, 2000, pp. 622-628
Authors:
Duxbury, N
Dawson, P
Bangert, U
Thrush, EJ
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Jacobs, K
Moerman, I
Citation: N. Duxbury et al., Effects of carrier gas on the properties of InGaN/GaN quantum well structures grown by MOCVD, PHYS ST S-B, 216(1), 1999, pp. 355-359
Authors:
Harris, JJ
Lee, KJ
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Korakakis, D
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Foxon, CT
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Moerman, I
Van der Stricht, W
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Hamilton, B
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Citation: Jj. Harris et al., Interpretation of the temperature-dependent transport properties of GaN/sapphire films grown by MBE and MOCVD, PHYS ST S-A, 176(1), 1999, pp. 363-367
Authors:
Vanhollebeke, K
Considine, L
Moerman, I
Demeester, P
Thrush, EJ
Crawley, JA
Citation: K. Vanhollebeke et al., Highly uniform AlAs/GaAs, InGa(Al)P/GaAs and InGaAs(P)/InP structures grown in a three 2" wafer close-spaced vertical rotating disk reactor, J CRYST GR, 195(1-4), 1998, pp. 644-647