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Results: 1-13 |
Results: 13

Authors: Lau, GS Tok, ES Wee, ATS Liu, R Lim, SL
Citation: Gs. Lau et al., The investigation of surface topography development in Si(001) and Si(111)during SIMS depth profiling, SURF REV L, 8(5), 2001, pp. 453-457

Authors: Tok, ES Zhang, J Kamiya, I Xie, MH Neave, JH Joyce, BA
Citation: Es. Tok et al., Missing "sheets" in the reciprocal space representation of the disordered surface with one-dimensional domain boundaries, SURF REV L, 8(5), 2001, pp. 509-511

Authors: Hartell, AD Tok, ES Zhang, J
Citation: Ad. Hartell et al., The development of RAS and RHEED as in situ probes to monitor dopant segregation in GS-MBE on Si (001), J CRYST GR, 227, 2001, pp. 729-734

Authors: Tok, ES Kang, HC
Citation: Es. Tok et Hc. Kang, Reaction path for hydrogen adsorption and desorption on Si(100)-(2X1), J CHEM PHYS, 115(14), 2001, pp. 6550-6556

Authors: Tok, ES Hartell, AD Zhang, J
Citation: Es. Tok et al., Kinetics of Si growth from hydride precursors on As-passivated Si(001) surface, APPL PHYS L, 78(7), 2001, pp. 919-921

Authors: Yang, C Kang, HC Tok, ES
Citation: C. Yang et al., Adsorption and coadsorption of hydrogen and fluorine on the Si(100)-(2 x 1) surface, SURF SCI, 465(1-2), 2000, pp. 9-18

Authors: Tok, ES Woods, NJ Price, RW Taylor, AG Zhang, J
Citation: Es. Tok et al., Optical second harmonic generation studies of epitaxial growth of Si and SiGe, J CRYST GR, 209(2-3), 2000, pp. 297-301

Authors: Price, RW Tok, ES Zhang, J
Citation: Rw. Price et al., Probing the silane, disilane and germane adsorption kinetics on the silicon (001) surface, J CRYST GR, 209(2-3), 2000, pp. 306-310

Authors: Tok, ES Woods, NJ Zhang, J
Citation: Es. Tok et al., RHEED and SIMS studies of germanium segregation during growth of SiGe/Si heterostructures; a two-site exchange model with growth rate dependence, J CRYST GR, 209(2-3), 2000, pp. 321-326

Authors: Tok, ES Price, RW Taylor, AG Zhang, J
Citation: Es. Tok et al., Oscillatory optical second-harmonic generation from Si(001) surface duringthin-film epitaxy, APPL PHYS L, 76(7), 2000, pp. 933-935

Authors: Price, RW Tok, ES Zhang, J
Citation: Rw. Price et al., Probing the disilane adsorption kinetics: An alternative approach, PHYS REV B, 59(8), 1999, pp. R5292-R5295

Authors: Steans, PH Neave, JH Zhang, J Tok, ES Bell, GR Joyce, BA Jones, TS
Citation: Ph. Steans et al., Re-entrant behaviour in GaAs(111)A homoepitaxy, J CRYST GR, 202, 1999, pp. 198-201

Authors: Garreau, Y Aid, K Sauvage-Simkin, M Pinchaux, R McConville, CF Jones, TS Sudijono, JL Tok, ES
Citation: Y. Garreau et al., Stoichiometry and discommensuration on InxGa1-xAs/GaAs(001) reconstructed surfaces: A quantitative x-ray diffuse-scattering study, PHYS REV B, 58(24), 1998, pp. 16177-16185
Risultati: 1-13 |