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Citation: Gg. Barna et al., SENSOR INTEGRATION INTO PLASMA ETCH REACTORS OF A DEVELOPMENTAL PILOTLINE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2860-2867

Authors: SAXENA S UNRUH A

Citation: S. Saxena et A. Unruh, DIAGNOSIS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT AND PROCESSES, IEEE transactions on semiconductor manufacturing, 7(2), 1994, pp. 220-232