S. Saxena et A. Unruh, DIAGNOSIS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT AND PROCESSES, IEEE transactions on semiconductor manufacturing, 7(2), 1994, pp. 220-232
This paper describes part of the research performed during the Microel
ectronic Manufacturing Science and Technology (MMST) program on techni
ques for the diagnosis of equipment malfunctions and misprocessing dur
ing semiconductor manufacturing. The main motivation of this work was
to investigate techniques for rapid diagnosis. Towards this goal, a nu
mber of equipment-level diagnosis techniques are described. These tech
niques use equipment models to diagnose equipment malfunctions at a gi
ven process step. The results obtained by applying these diagnosis app
roaches are very encouraging. The various approaches were able to diag
nose a number of faults that were deliberately introduced to test the
algorithms, and the equipment faults that developed during the final d
emonstration of the MMST program. These techniques were applied to a T
I-built Advanced Vacuum Processor (AVP) and an Applied Materials Preci
sion reactor AMT 5000.