Authors: Na, HJ Jeong, JK Um, MY Kim, BS Hwang, CS Kim, HJ

Citation: Hj. Na et al., Effect of annealing on electrical properties of Pt/beta-SiC contact, SOL ST ELEC, 45(9), 2001, pp. 1565-1570

Authors: Jeong, JK Na, HJ Kim, BS Um, MY Kim, HJ

Citation: Jk. Jeong et al., Morphological and structural characteristics of homoepitaxial 4H-SiC thin films by chemical vapor deposition using bis-trimethylsilylmethane precursor, THIN SOL FI, 377, 2000, pp. 567-572

Authors: Um, MY Lee, SK Kim, HJ

Citation: My. Um et al., In-situ low temperature N2O plasma annealing for high-dielectric Ta2O5 thin films, J KOR PHYS, 35, 1999, pp. S791-S794