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Results: 1-8 |
Results: 8
CHARACTERIZATION OF MULTILAYERS BY MEANS OF EDXS IN THE ANALYTICAL TEM
Authors: THOMAS J RENNEKAMP R VANLOYEN L
Citation: J. Thomas et al., CHARACTERIZATION OF MULTILAYERS BY MEANS OF EDXS IN THE ANALYTICAL TEM, Fresenius' journal of analytical chemistry, 361(6-7), 1998, pp. 633-636
THE ABSENCE OF ANTIFERROMAGNETIC COUPLING AND GMR EFFECT IN EVAPORATED PERMALLOY CU MULTILAYERS, IN-SITU TRANSPORT-PROPERTIES/
Authors: LUCINSKI T REISS G MATTERN N VANLOYEN L
Citation: T. Lucinski et al., THE ABSENCE OF ANTIFERROMAGNETIC COUPLING AND GMR EFFECT IN EVAPORATED PERMALLOY CU MULTILAYERS, IN-SITU TRANSPORT-PROPERTIES/, Journal of magnetism and magnetic materials, 189(1), 1998, pp. 39-46
PRESENCE AND ABSENCE OF ANTIFERROMAGNETIC COUPLING AND GIANT MAGNETORESISTANCE IN SPUTTERED AND EVAPORATED PERMALLOY COPPER MULTILAYERS/
Authors: REISS G VANLOYEN L LUCINSKI T ELEFANT D BRUCKL H MATTERN N RENNEKAMP R ERNST W
Citation: G. Reiss et al., PRESENCE AND ABSENCE OF ANTIFERROMAGNETIC COUPLING AND GIANT MAGNETORESISTANCE IN SPUTTERED AND EVAPORATED PERMALLOY COPPER MULTILAYERS/, Journal of magnetism and magnetic materials, 184(3), 1998, pp. 281-288
METALLURGICAL ANALYSIS AND RF LOSSES IN SUPERCONDUCTING NIOBIUM THIN-FILM CAVITIES
Authors: BLOESS D DURAND C MAHNER E NAKAI H WEINGARTEN W BOSLAND P MAYER J VANLOYEN L
Citation: D. Bloess et al., METALLURGICAL ANALYSIS AND RF LOSSES IN SUPERCONDUCTING NIOBIUM THIN-FILM CAVITIES, IEEE transactions on applied superconductivity, 7(2), 1997, pp. 1776-1780
THE INFLUENCE OF ANNEALING ON TEMPERATURE DEPENDENCIES OF THE MAGNETORESISTIVITY AND RESISTIVITY OF FE CR MULTILAYERS/
Authors: LUCINSKI T ELEFANT D REISS G VANLOYEN L
Citation: T. Lucinski et al., THE INFLUENCE OF ANNEALING ON TEMPERATURE DEPENDENCIES OF THE MAGNETORESISTIVITY AND RESISTIVITY OF FE CR MULTILAYERS/, Physica status solidi. a, Applied research, 160(1), 1997, pp. 133-144
EXPOSURE OF MONOMOLECULAR RESISTS WITH LOW-ENERGY ELECTRONS
Authors: KIRK ECG MERTIG M MONCH I BERTRAM M SCHUMANN J VANLOYEN L GLADUN A REISS G
Citation: Ecg. Kirk et al., EXPOSURE OF MONOMOLECULAR RESISTS WITH LOW-ENERGY ELECTRONS, Nanostructured materials, 6(5-8), 1995, pp. 703-706
HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS
Authors: MERTIG M KIRK ECG MONCH I BERTRAM M EDELMANN J SCHUMANN J VANLOYEN L GLADUN A REISS G
Citation: M. Mertig et al., HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS, Physica. B, Condensed matter, 210(3-4), 1995, pp. 468-471
STUDY OF THE PRODUCTION OF CR-NI-AL SPUTT ERING TARGETS BY VACUUM PLASMA SPLAYING
Authors: KUNERT W SCHWARZ K VANLOYEN L
Citation: W. Kunert et al., STUDY OF THE PRODUCTION OF CR-NI-AL SPUTT ERING TARGETS BY VACUUM PLASMA SPLAYING, Metall, 49(5), 1995, pp. 342-345
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