Authors: VELEZ MH GARRIDO OS GUTIERREZ FF FALCONY C DUART JMM

Citation: Mh. Velez et al., REMOTE PLASMA CHEMICAL-VAPOR-DEPOSITION SILICON OXYNITRIDE THIN-FILMS- DIELECTRIC-PROPERTIES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1087-1092

Authors: GUTIERREZ FF RUIZSALVADOR AR MPEKO JC VELEZ MH

Citation: Ff. Gutierrez et al., PROTON MOBILITY CALCULATIONS IN THE PRESENCE OF NEGATIVE CAPACITANCES, Europhysics letters (Print), 44(2), 1998, pp. 211-215

Authors: SANCHEZ O AGUILAR MA FALCONY C MARTINEZDUART JM VELEZ MH

Citation: O. Sanchez et al., CHARACTERIZATION OF SIOXNY FILMS DEPOSITED FROM SICL4 BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 317(1-2), 1998, pp. 149-152

Authors: POZA MMG VELEZ MH JIMENEZ J GOMEZALEIXANDRE C OLIAS JS MONTES AB ALBELLA JM

Citation: Mmg. Poza et al., CHARACTERIZATION OF BIAS ENHANCED MWCVD DIAMOND THIN-FILMS, Materials letters, 29(1-3), 1996, pp. 111-115