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Results: 2
COMPARISON OF THE SUBMICRON PARTICLE ANALYSIS CAPABILITIES OF AUGER-ELECTRON SPECTROSCOPY, TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, AND SCANNING ELECTRON-MICROSCOPY WITH ENERGY-DISPERSIVE X-RAY SPECTROSCOPY FOR PARTICLES DEPOSITED ON SILICON-WAFERS WITH ONE MICRON THICK OXIDE LAYERS (VOL 16, PG 1825, 1998)
Authors: DIEBOLD AC LINDLEY P VITERALLI J KINGSLEY J LIU BYH WOO KS
Citation: Ac. Diebold et al., COMPARISON OF THE SUBMICRON PARTICLE ANALYSIS CAPABILITIES OF AUGER-ELECTRON SPECTROSCOPY, TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, AND SCANNING ELECTRON-MICROSCOPY WITH ENERGY-DISPERSIVE X-RAY SPECTROSCOPY FOR PARTICLES DEPOSITED ON SILICON-WAFERS WITH ONE MICRON THICK OXIDE LAYERS (VOL 16, PG 1825, 1998), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(5), 1998, pp. 3148-3148
COMPARISON OF THE SUBMICRON PARTICLE ANALYSIS CAPABILITIES OF AUGER-ELECTRON SPECTROSCOPY, TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, AND SCANNING ELECTRON-MICROSCOPY WITH ENERGY-DISPERSIVE X-RAY SPECTROSCOPY FOR PARTICLES DEPOSITED ON SILICON-WAFERS WITH 1 MU-M THICK OXIDELAYERS
Authors: DIEBOLD AC LINDLEY P VITERALLI J KINGSLEY J LIU BYH WOO KS
Citation: Ac. Diebold et al., COMPARISON OF THE SUBMICRON PARTICLE ANALYSIS CAPABILITIES OF AUGER-ELECTRON SPECTROSCOPY, TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, AND SCANNING ELECTRON-MICROSCOPY WITH ENERGY-DISPERSIVE X-RAY SPECTROSCOPY FOR PARTICLES DEPOSITED ON SILICON-WAFERS WITH 1 MU-M THICK OXIDELAYERS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1825-1831
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