Authors:
Bolhovityanov, YB
Pchelyakov, OP
Sokolov, LV
Nikiforov, AI
Voigtlander, B
Citation: Yb. Bolhovityanov et al., Self-organizing and self-assembling of GexSi1-x quantum dots - mechanisms of formation by MBE, IAN FIZ, 65(2), 2001, pp. 180-186
Citation: B. Voigtlander, Fundamental processes in Si/Si and Ge/Si epitaxy studied by scanning tunneling microscopy during growth, SURF SCI R, 43(5-8), 2001, pp. 127
Authors:
Emundts, A
Coenen, P
Pirug, G
Voigtlander, B
Bonzel, HP
Wynblatt, P
Citation: A. Emundts et al., Combination of a Besocke-type scanning tunneling microscope with a scanning electron microscope, REV SCI INS, 72(9), 2001, pp. 3546-3551
Authors:
Pchelyakov, OP
Bolkhovityanov, YB
Dvurechenskii, AV
Sokolov, LV
Nikiforov, AI
Yakimov, AI
Voigtlander, B
Citation: Op. Pchelyakov et al., Silicon-germanium nanostructures with quantum dots: Formation mechanisms and electrical properties, SEMICONDUCT, 34(11), 2000, pp. 1229-1247
Citation: B. Voigtlander et N. Theuerkauf, Ordered growth of Ge islands above a misfit dislocation network in a Ge layer on Si(111), SURF SCI, 461(1-3), 2000, pp. L575-L580
Citation: De. Jesson et al., Direct observation of subcritical fluctuations during the formation of strained semiconductor islands, PHYS REV L, 84(2), 2000, pp. 330-333
Citation: B. Voigtlander et M. Kastner, Scanning tunneling microscopy tip shape imaging by "shadowing": Monitoringof in situ tip preparation, J VAC SCI B, 17(2), 1999, pp. 294-296
Citation: B. Voigtlander et M. Kastner, Evolution of the strain relaxation in a Ge layer on Si(001) by reconstruction and intermixing, PHYS REV B, 60(8), 1999, pp. R5121-R5124