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Results: 1-10 |
Results: 10
The heavy ion micro-projection setup at Bochum
Authors: Stephan, A Meijer, J Weidenmuller, U Rocken, H Bukow, HH Burchard, M Zaitsev, A Volland, B Rangelow, IW
Citation: A. Stephan et al., The heavy ion micro-projection setup at Bochum, NUCL INST B, 181, 2001, pp. 39-43
Noncontacting laser-based techniques for the determination of elastic constants of thin silicon membranes
Authors: Weiss, B Klein, M Sossna, E Volland, B Rangelow, IW
Citation: B. Weiss et al., Noncontacting laser-based techniques for the determination of elastic constants of thin silicon membranes, MICROEL ENG, 57-8, 2001, pp. 475-479
Evaluation and fabrication of AFM array for ESA-Midas /Rosetta space mission
Authors: Barth, W Debski, T Abedinov, N Ivanov, T Heerlein, H Volland, B Gotszalk, T Rangelow, IW Torkar, K Fritzenwallner, K Grabiec, P Studzinska, K Kostic, I Hudek, P
Citation: W. Barth et al., Evaluation and fabrication of AFM array for ESA-Midas /Rosetta space mission, MICROEL ENG, 57-8, 2001, pp. 825-831
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment
Authors: Volland, B Shi, F Heerlein, H Rangelow, IW Hudek, P Kostic, I Cekan, E Vonach, H Loeschner, H Horner, C Stengl, G Buschbeck, H Zeininger, M Bleeker, A Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206
Field emission arrays by silicon micromachining
Authors: Debski, T Volland, B Barth, W Shi, F Hudek, P Rangelow, IW Grabiec, P Studzinska, K Zaborowski, M Mitura, S
Citation: T. Debski et al., Field emission arrays by silicon micromachining, J VAC SCI B, 18(2), 2000, pp. 896-899
Dry etching with gas chopping without rippled sidewalls
Authors: Volland, B Hudek, FS Heerlein, H Rangelow, IW
Citation: B. Volland et al., Dry etching with gas chopping without rippled sidewalls, J VAC SCI B, 17(6), 1999, pp. 2768-2771
Experimental results of the stochastic Coulomb interaction in ion projection lithography
Authors: de Jager, PWH Derksen, G Mertens, B Cekan, E Lammer, G Vonach, H Buschbeck, H Zeininger, M Horner, C Loschner, H Stengl, G Bleeker, AJ Benschop, J Shi, F Volland, B Hudek, P Heerlein, H Rangelow, IW Kaesmaier, R
Citation: Pwh. De Jager et al., Experimental results of the stochastic Coulomb interaction in ion projection lithography, J VAC SCI B, 17(6), 1999, pp. 3098-3106
Comparison of silicon stencil mask distortion measurements with finite element analysis
Authors: Ehrmann, A Struck, T Chalupka, A Haugeneder, E Loschner, H Butschke, J Irmscher, M Letzkus, F Springer, R Degen, A Rangelow, IW Shi, F Sossna, E Volland, B Engelstad, R Lovell, E Tejeda, R
Citation: A. Ehrmann et al., Comparison of silicon stencil mask distortion measurements with finite element analysis, J VAC SCI B, 17(6), 1999, pp. 3107-3111
Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness
Authors: Rangelow, IW Shi, F Hudek, P Grabiec, P Volland, B Givargizov, EI Stepanova, AN Obolenskaya, LN Mashkova, ES Molchanov, VA
Citation: Iw. Rangelow et al., Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness, J VAC SCI B, 16(6), 1998, pp. 3185-3191
p-n junction-based wafer flow process for stencil mask fabrication
Authors: Rangelow, IW Shi, F Volland, B Sossna, E Petrashenko, A Hudek, P Sunyk, R Butschke, J Letzkus, F Springer, R Ehrmann, A Gross, G Kaesmaier, R Oelmann, A Struck, T Unger, G Chalupka, A Haugeneder, E Lammer, G Loschner, H Tejeda, R Lovell, E Engelstad, R
Citation: Iw. Rangelow et al., p-n junction-based wafer flow process for stencil mask fabrication, J VAC SCI B, 16(6), 1998, pp. 3592-3598
Risultati: 1-10 |