Authors: WROBEL AM WALKIEWICZPIETRZYKOWSKA A

Citation: Am. Wrobel et A. Walkiewiczpietrzykowska, MECHANISM OF THE INITIATION STEP IN ATOMIC HYDROGEN-INDUCED CVD OF AMORPHOUS HYDROGENATED SILICON-CARBON FILMS FROM SINGLE-SOURCE PRECURSORS, CHEMICAL VAPOR DEPOSITION, 4(4), 1998, pp. 133-141

Authors: WROBEL AM WALKIEWICZPIETRZYKOWSKA A WICKRAMANAYAKA S HATANAKA Y

Citation: Am. Wrobel et al., MECHANISM OF AMORPHOUS SILICA FILM FORMATION FROM TETRAETHOXYSILANE IN ATOMIC OXYGEN-INDUCED CHEMICAL-VAPOR-DEPOSITION, Journal of the Electrochemical Society, 145(8), 1998, pp. 2866-2876

Authors: WROBEL AM WALKIEWICZPIETRZYKOWSKA A STASIAK M AOKI T HATANAKA Y SZUMILEWICZ J

Citation: Am. Wrobel et al., REACTIVITY OF ALKYLSILANES AND ALKYLCARBOSILANES IN ATOMIC HYDROGEN-INDUCED CHEMICAL-VAPOR-DEPOSITION, Journal of the Electrochemical Society, 145(3), 1998, pp. 1060-1065

Authors: WROBEL AM WALKIEWICZPIETRZYKOWSKA A STASIAK M KULPINSKI J

Citation: Am. Wrobel et al., CONVERSION OF TETRAETHOXYSILANE (TEOS) TO SILICA FILM-FORMING PRECURSORS IN ATOMIC OXYGEN-INDUCED CHEMICAL-VAPOR-DEPOSITION (VOL 2, PG 285,1996), CHEMICAL VAPOR DEPOSITION, 3(2), 1997, pp. 73-73

Authors: WALKIEWICZPIETRZYKOWSKA A WROBEL AM KRYSZEWSKI M

Citation: A. Walkiewiczpietrzykowska et al., ALKYLSILANES AND ALKYLCARBOSILANES AS SINGLE-SOURCE PRECURSORS FOR THE FORMATION OF A-SI-C-H THIN-FILM MATERIALS BY ATOMIC HYDROGEN-INDUCEDCHEMICAL-VAPOR-DEPOSITION, Polish Journal of Chemistry, 71(12), 1997, pp. 1831-1840

Authors: WROBEL AM WALKIEWICZPIETRZYKOWSKA A STASIAK M KULPINSKI J

Citation: Am. Wrobel et al., CONVERSION OF TETRAETHOXYSILANE (TEOS) TO SILICA FILM-FORMING PRECURSORS IN ATOMIC OXYGEN-INDUCED CHEMICAL-VAPOR-DEPOSITION, CHEMICAL VAPOR DEPOSITION, 2(6), 1996, pp. 285-291