AAAAAA

   
Results: 1-2 |
Results: 2
SURFACE METAL CONTAMINATION DURING ION-IMPLANTATION - COMPARISON OF MEASUREMENTS BY SECONDARY-ION MASS-SPECTROSCOPY, TOTAL-REFLECTION X-RAY-FLUORESCENCE SPECTROMETRY, AND VAPOR-PHASE DECOMPOSITION USED IN CONJUNCTION WITH GRAPHITE-FURNACE ATOMIC-ABSORPTION SPECTROMETRY AND INDUCTIVELY-COUPLED PLASMA-MASS SPECTROMETRY
Authors: FROST MR HARRINGTON WL DOWNEY DF WALTHER SR
Citation: Mr. Frost et al., SURFACE METAL CONTAMINATION DURING ION-IMPLANTATION - COMPARISON OF MEASUREMENTS BY SECONDARY-ION MASS-SPECTROSCOPY, TOTAL-REFLECTION X-RAY-FLUORESCENCE SPECTROMETRY, AND VAPOR-PHASE DECOMPOSITION USED IN CONJUNCTION WITH GRAPHITE-FURNACE ATOMIC-ABSORPTION SPECTROMETRY AND INDUCTIVELY-COUPLED PLASMA-MASS SPECTROMETRY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 329-335
CHARACTERIZATION OF A BERNAS ION-SOURCE FOR MULTIPLY-CHARGED ION-IMPLANTATION
Authors: WALTHER SR
Citation: Sr. Walther, CHARACTERIZATION OF A BERNAS ION-SOURCE FOR MULTIPLY-CHARGED ION-IMPLANTATION, Review of scientific instruments, 65(4), 1994, pp. 1307-1309
Risultati: 1-2 |