Authors:
Lefevre, A
Lewis, LJ
Martinu, L
Wertheimer, MR
Citation: A. Lefevre et al., Structural properties of silicon dioxide thin films densified by medium-energy particles - art. no. 115429, PHYS REV B, 6411(11), 2001, pp. 5429
Authors:
Dennler, G
Houdayer, A
Latreche, M
Segui, Y
Wertheimer, MR
Citation: G. Dennler et al., Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO2 on polymeric substrates, THIN SOL FI, 382(1-2), 2001, pp. 1-3
Citation: V. Nikonov et al., Surface charge and photoionization effects in short air gaps undergoing discharges at atmospheric pressure, J PHYS D, 34(19), 2001, pp. 2979-2986
Authors:
Hallil, A
Zabeida, O
Wertheimer, MR
Martinu, L
Citation: A. Hallil et al., Mass-resolved ion energy distributions in continuous dual mode microwave/radio frequency plasmas in argon and nitrogen, J VAC SCI A, 18(3), 2000, pp. 882-890
Authors:
Sobrinho, ASD
Czeremuszkin, G
Latreche, M
Wertheimer, MR
Citation: Asd. Sobrinho et al., Defect-permeation correlation for ultrathin transparent barrier coatings on polymers, J VAC SCI A, 18(1), 2000, pp. 149-157
Authors:
Lerouge, S
Wertheimer, MR
Marchand, R
Tabrizian, M
Yahia, L
Citation: S. Lerouge et al., Effect of gas composition on spore mortality and etching during low-pressure plasma sterilization, J BIOMED MR, 51(1), 2000, pp. 128-135
Authors:
Zabeida, O
Hallil, A
Wertheimer, MR
Martinu, L
Citation: O. Zabeida et al., Time-resolved measurements of ion energy distributions in dual-mode pulsed-microwave/radio frequency plasma, J APPL PHYS, 88(2), 2000, pp. 635-642
Citation: Ac. Fozza et al., Vacuum ultraviolet to visible emission from hydrogen plasma: Effect of excitation frequency, J APPL PHYS, 88(1), 2000, pp. 20-33
Citation: Mr. Wertheimer et al., Industrial processing of polymers by low-pressure plasmas: the role of VUVradiation, NUCL INST B, 151(1-4), 1999, pp. 65-75