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Results:
1-25
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Results: 25
Authors:
Horng, RL
Lien, YC
Peng, WC
Wuu, DS
Tseng, CY
Seieh, CH
Huang, MF
Tsai, SJ
Liu, JSR
Citation: Rl. Horng et al., High-brightness wafer-bonded indium-tin oxide/light-emitting diode/mirror/Si, JPN J A P 1, 40(4B), 2001, pp. 2747-2751
Authors:
Horng, RH
Wuu, DS
Seieh, CH
Peng, WC
Huang, MF
Tsai, SJ
Liu, JS
Citation: Rh. Horng et al., Wafer bonding of 50-mm-diameter mirror substrates to AlGaInP light-emitting diode wafers, J ELEC MAT, 30(8), 2001, pp. 907-910
Authors:
Wuu, DS
Horng, RH
Chang, CC
Wu, YY
Citation: Ds. Wuu et al., Various properties of sputter-deposited Ta-Ru thin films, APPL SURF S, 169, 2001, pp. 392-395
Authors:
Wuu, DS
Kuo, NH
Liao, FC
Horng, RH
Lee, MK
Citation: Ds. Wuu et al., Etching of platinum thin films in an inductively coupled plasma, APPL SURF S, 169, 2001, pp. 638-643
Authors:
Horng, RH
Wuu, DS
Kung, CY
Lin, JC
Leu, CC
Huang, TY
Sze, SM
Citation: Rh. Horng et al., Ion-implanted treatment of (Ba, Sr)TiO3 films for DRAM applications, J NON-CRYST, 280(1-3), 2001, pp. 48-53
Authors:
Wuu, DS
Horng, RH
Liao, FC
Lin, CC
Citation: Ds. Wuu et al., Nitridation of (Ba,Sr)TiO3 films in an inductively coupled plasma, J NON-CRYST, 280(1-3), 2001, pp. 211-216
Authors:
Horng, RH
Wuu, DS
Lien, YC
Lan, WH
Citation: Rh. Horng et al., Low-resistance and high-transparency Ni/indium tin oxide ohmic contacts top-type GaN, APPL PHYS L, 79(18), 2001, pp. 2925-2927
Authors:
Wuu, DS
Liao, FC
Kuo, NH
Horng, RH
Lee, MK
Citation: Ds. Wuu et al., Etching characteristics and mechanism of Ba0.7Sr0.3TiO3 thin films in an inductively coupled plasma, JPN J A P 1, 39(4B), 2000, pp. 2068-2072
Authors:
Horng, RH
Wuu, DS
Wei, SC
Tseng, CT
Huang, MF
Chang, KH
Liu, PH
Lin, KC
Citation: Rh. Horng et al., Wafer-bonded AlGaInP/Au/AuBe/SiO2/Si light-emitting diodes, JPN J A P 1, 39(4B), 2000, pp. 2357-2359
Authors:
Horng, RH
Wuu, DS
Kung, CY
Lin, CC
Leu, CC
Haung, TY
Sze, SM
Citation: Rh. Horng et al., Ion-implantation treatment (Ba, Sr)TiO3 thin films, JPN J A P 1, 39(12A), 2000, pp. 6614-6618
Authors:
Chung, CK
Hwang, J
Jaw, TH
Wuu, DS
Citation: Ck. Chung et al., Electrical properties of Ir-silicide formation on p-Si(100) in ultra-high vacuum, THIN SOL FI, 373(1-2), 2000, pp. 68-72
Authors:
Wuu, DS
Chan, CC
Horng, RH
Citation: Ds. Wuu et al., Characterization of sputtered Ta-Ru thin films for ink-jet heater applications, THIN SOL FI, 373(1-2), 2000, pp. 84-88
Authors:
Horng, RH
Wuu, DS
Wu, LH
Lee, MK
Citation: Rh. Horng et al., Formation process and material properties of reactive sputtered IrO2 thin films, THIN SOL FI, 373(1-2), 2000, pp. 231-234
Authors:
Wuu, DS
Horng, RH
Liao, FC
Leu, CC
Huang, TY
Sze, SM
Chen, HY
Chang, CY
Citation: Ds. Wuu et al., Characterization of NH3 plasma-treated Ba0.7Sr0.3TiO3 thin films, MICROEL REL, 40(4-5), 2000, pp. 663-666
Authors:
Horng, RH
Wuu, DS
Leu, CC
Chan, SH
Huang, TY
Sze, SM
Citation: Rh. Horng et al., Effects of fluorine-implanted treatment on Ba0.7Sr0.3TiO3 films, MICROEL REL, 40(4-5), 2000, pp. 667-670
Authors:
Leu, CC
Chan, SH
Chen, HY
Horng, RH
Wuu, DS
Wu, LH
Huang, TY
Chang, CY
Sze, SM
Citation: Cc. Leu et al., Effects of O-2 plasma treatment on the electric and dielectric characteristics of Ba0.7Sr0.3TiO3 thin films, MICROEL REL, 40(4-5), 2000, pp. 679-682
Authors:
Wuu, DS
Lin, WT
Pan, CC
Horng, RH
Citation: Ds. Wuu et al., Growth characteristics of GaN on (001)GaP substrates by MOVPE, J CRYST GR, 221, 2000, pp. 286-292
Authors:
Wuu, DS
Horng, RH
Tseng, WH
Lin, WT
Kung, CY
Citation: Ds. Wuu et al., Influences of temperature ramping rate on GaN buffer layers and subsequentGaN overlayers grown by metalorganic chemical vapor deposition, J CRYST GR, 220(3), 2000, pp. 235-242
Authors:
Wuu, DS
Chan, CC
Horng, RH
Citation: Ds. Wuu et al., Material characteristics and thermal stability of cosputtered Ta-Ru thin films, J VAC SCI A, 17(6), 1999, pp. 3327-3332
Authors:
Wuu, DS
Chan, CC
Horng, RH
Lin, WC
Chiu, SL
Wu, YY
Citation: Ds. Wuu et al., Structural and electrical properties of Ta-Al thin films by magnetron sputtering, APPL SURF S, 145, 1999, pp. 315-318
Authors:
Wuu, DS
Horng, RH
Chan, CC
Lee, YS
Citation: Ds. Wuu et al., Plasma-deposited amorphous silicon carbide films for micromachined fluidicchannels, APPL SURF S, 145, 1999, pp. 708-712
Authors:
Horng, RN
Wuu, DS
Wu, LH
Wei, SC
Chan, SH
Leu, CC
Huang, TY
Sze, SM
Lee, MK
Citation: Rn. Horng et al., Co-sputtered Ru-Ti alloy electrodes for DRAM applications, THIN SOL FI, 344, 1999, pp. 598-601
Authors:
Horng, RH
Wuu, DS
Wei, SC
Chan, SH
Kung, CY
Citation: Rh. Horng et al., A research on the persistent photoconductivity behavior of GaN thin films deposited by r.f. magnetron sputtering, THIN SOL FI, 344, 1999, pp. 642-645
Authors:
Horng, RH
Wuu, DS
Wei, SC
Tseng, CY
Huang, MF
Chang, KH
Liu, PH
Lin, KC
Citation: Rh. Horng et al., AlGaInP light-emitting diodes with mirror substrates fabricated by wafer bonding, APPL PHYS L, 75(20), 1999, pp. 3054-3056
Authors:
Horng, RH
Wuu, DS
Wei, SC
Huang, MF
Chang, KH
Liu, PH
Lin, KC
Citation: Rh. Horng et al., AlGaInP/AuBe/glass light-emitting diodes fabricated by wafer bonding technology, APPL PHYS L, 75(2), 1999, pp. 154-156
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