Authors:
YAMAMOTO J
UCHINO S
OHTA H
YOSHIMURA T
MURAI F
Citation: J. Yamamoto et al., ACCURATE CRITICAL DIMENSION CONTROL BY USING AN AZIDE NOVOLAK RESIST PROCESS FOR ELECTRON-BEAM LITHOGRAPHY/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2868-2871