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Results: 10

Authors: MAKEDONOPOULOU S MAVRIDIS IM YANNAKOPOULOU K PAPAIOANNOU J
Citation: S. Makedonopoulou et al., ORGANIZATION OF LONG ALIPHATIC MONOCARBOXYLIC ACIDS IN BETA-CYCLODEXTRIN CHANNELS - CRYSTAL-STRUCTURES OF THE INCLUSION COMPLEXES OF TRIDECANOIC ACID AND (Z)-TETRADEC-7-ENOIC ACID IN BETA-CYCLODEXTRIN, Chemical communications, (19), 1998, pp. 2133-2134

Authors: BOTSI A YANNAKOPOULOU K HADJOUDIS E PERLY B
Citation: A. Botsi et al., STRUCTURAL ASPECTS OF PERMETHYLATED CYCLODEXTRINS AND COMPARISON WITHTHEIR PARENT OLIGOSACCHARIDES, AS DERIVED FROM UNEQUIVOCALLY ASSIGNEDH-1 AND C-13 NMR-SPECTRA IN AQUEOUS-SOLUTIONS, Magnetic resonance in chemistry, 34(6), 1996, pp. 419-423

Authors: YANNAKOPOULOU K MENTZAFOS D MAVRIDIS IM DANDIKA K
Citation: K. Yannakopoulou et al., CHIRAL RECOGNITION OF (R)-(-)-1,7-DIOXASPIRO[5.5]UNDECANE BY HEXAKIS(2,3,6-TRI-O-METHYL)-ALPHA-CYCLODEXTRIN, Angewandte Chemie, International Edition in English, 35(21), 1996, pp. 2480-2482

Authors: BOTSI A YANNAKOPOULOU K HADJOUDIS E WAITE J
Citation: A. Botsi et al., AM1 CALCULATIONS ON INCLUSION COMPLEXES OF CYCLOMALTOHEPTAOSE (BETA-CYCLODEXTRIN) WITH 1,7-DIOXASPIRO[5.5]UNDECANE AND NONANAL, AND COMPARISON WITH EXPERIMENTAL RESULTS, Carbohydrate research, 283, 1996, pp. 1-16

Authors: ARKAS M YANNAKOPOULOU K PALEOS CM WEBER P SKOULIOS A
Citation: M. Arkas et al., THE MESOMORPHIC BEHAVIOR OF CYANOPROPYLALKYLDIMETHYLAMMONIUM BROMIDES, Liquid crystals, 18(4), 1995, pp. 563-569

Authors: BOTSI A YANNAKOPOULOU K PERLY B HADJOUDIS E
Citation: A. Botsi et al., POSITIVE OR ADVERSE-EFFECTS OF METHYLATION ON THE INCLUSION BEHAVIOR OF CYCLODEXTRINS - A COMPARATIVE NMR-STUDY USING PHEROMONE CONSTITUENTS OF THE OLIVE FRUIT-FLY, Journal of organic chemistry, 60(13), 1995, pp. 4017-4023

Authors: KATRITZKY AR YANNAKOPOULOU K LANG HY
Citation: Ar. Katritzky et al., AMINAL EXCHANGE, Perkin transactions. 2, (8), 1994, pp. 1867-1870

Authors: GOGOLIDES E YANNAKOPOULOU K TRAVERSE A NASSIOPOULOS AG TSOIS E HATZAKIS M
Citation: E. Gogolides et al., CHARACTERIZATION OF A POSITIVE-TONE WET SILYLATION PROCESS WITH THE AZ-5214(TM) PHOTORESIST, Microelectronic engineering, 25(1), 1994, pp. 75-90

Authors: GOGOLIDES E BAIK KH YANNAKOPOULOU K VANDENHOVE L HATZAKIS M
Citation: E. Gogolides et al., LITHOGRAPHIC EVALUATION OF A NEW WET SILYLATION PROCESS USING SAFE SOLVENTS AND THE COMMERCIAL PHOTORESIST AZ 5214E(TM), Microelectronic engineering, 23(1-4), 1994, pp. 267-270

Authors: GOGOLIDES E YANNAKOPOULOU K NASSIOPOULOS AG TSOIS E HATZAKIS M
Citation: E. Gogolides et al., CHARACTERIZATION OF A POSITIVE-TONE WET SILYLATION PROCESS WITH THE AZ 5214TM PHOTORESIST, Microelectronic engineering, 21(1-4), 1993, pp. 263-266
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