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Results:
1-7
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Results: 7
Authors:
KWON KH
KIM CI
YUN SJ
YEOM GY
Citation: Kh. Kwon et al., ETCHING PROPERTIES OF PT THIN-FILMS BY INDUCTIVELY-COUPLED PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(5), 1998, pp. 2772-2776
Authors:
LEE YH
KIM HS
YEOM GY
LEE JW
YOO MC
KIM TI
Citation: Yh. Lee et al., ETCH CHARACTERISTICS OF GAN USING INDUCTIVELY-COUPLED CL-2 AR AND CL-2/BCL3 PLASMAS/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1478-1482
Authors:
KIM HR
PARK HH
HYUN SH
YEOM GY
Citation: Hr. Kim et al., EFFECT OF O-2 PLASMA TREATMENT ON THE PROPERTIES OF SIO2 AEROGEL FILM, Thin solid films, 332(1-2), 1998, pp. 444-448
Authors:
KIM HS
LEE YH
YEOM GY
LEE JW
KIM TI
Citation: Hs. Kim et al., EFFECTS OF INDUCTIVELY-COUPLED PLASMA CONDITIONS ON THE ETCH PROPERTIES OF GAN AND OHMIC CONTACT FORMATIONS, Materials science & engineering. B, Solid-state materials for advanced technology, 50(1-3), 1997, pp. 82-87
Authors:
LEE JH
YEOM GY
LEE JW
LEE JY
Citation: Jh. Lee et al., STUDY OF SHALLOW SILICON TRENCH ETCH PROCESS USING PLANAR INDUCTIVELY-COUPLED PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 573-578
Authors:
NAM WJ
YEOM GY
KIM JH
WHANG KW
YOON JK
Citation: Wj. Nam et al., PHYSICAL DAMAGE AND CONTAMINATION BY MAGNETIZED INDUCTIVELY-COUPLED PLASMAS AND EFFECTS OF VARIOUS CLEANING AND ANNEALING METHODS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 590-595
Authors:
KIM HS
NAM WJ
YEOM GY
LEE HJ
KIM JH
WHANG KW
Citation: Hs. Kim et al., STUDY OF RADIATION-DAMAGE AND CONTAMINATION BY MAGNETIZED INDUCTIVELY-COUPLED PLASMA-ETCHING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1062-1066
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