Authors:
Yuh, HK
Park, JW
Lim, SH
Hwang, KH
Yoon, E
Citation: Hk. Yuh et al., Low-temperature Si epitaxial growth on oxide patterned wafers by ultrahighvacuum electron cyclotron resonance chemical vapor deposition, J VAC SCI B, 19(2), 2001, pp. 323-326
Citation: Sh. Lim et al., Dry cleaning of fluorocarbon residues by low-power electron cyclotron resonance hydrogen plasma, J KOR PHYS, 33, 1998, pp. S108-S111