Authors:
Skorokhodov, SS
Bogolyubova, SS
Klimova, NV
Rudaya, LI
Yurre, TA
Citation: Ss. Skorokhodov et al., Photochemical properties of oligomeric esters of 2,5-benzophenonedicarboxylic acid, RUS J AP CH, 73(2), 2000, pp. 280-284
Authors:
Guk, EG
Kamanin, AV
Shmidt, NM
Shuman, VB
Yurre, TA
Citation: Eg. Guk et al., Dopant impurity diffusion from polymer diffusants and its applications in semiconductor device technology. A review, SEMICONDUCT, 33(3), 1999, pp. 265-275
Citation: Vn. Demidov et al., Azide-containing phosphine oxides for photoresists-diffusants: Synthesis and photochemical and diffusion characteristics, RUS J AP CH, 71(7), 1998, pp. 1219-1223