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THE EVOLUTION OF THE MICROSCOPIC DAMAGE IN ELECTROMIGRATION STUDIED BY MULTIPLE ELECTRICAL MEASUREMENTS
Authors: JONES BK XU YZ ZOBBI P
Citation: Bk. Jones et al., THE EVOLUTION OF THE MICROSCOPIC DAMAGE IN ELECTROMIGRATION STUDIED BY MULTIPLE ELECTRICAL MEASUREMENTS, Microelectronics and reliability, 36(7-8), 1996, pp. 1051-1062
ELECTRICAL MEASUREMENTS AS EARLY INDICATORS OF ELECTROMIGRATION FAILURE
Authors: JONES BK XU YZ DENTON TC ZOBBI P
Citation: Bk. Jones et al., ELECTRICAL MEASUREMENTS AS EARLY INDICATORS OF ELECTROMIGRATION FAILURE, Microelectronics and reliability, 35(1), 1995, pp. 13-25
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