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Citation: K. Heister et al., An enhanced sensitivity of alkanethiolate self-assembled monolayers to electron irradiation through the incorporation of a sulfide entity into the alkyl chains, J PHYS CH B, 103(50), 1999, pp. 11098-11104
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Citation: K. Heister et al., Deviations from 1 : 1 compositions in self-assembled monolayers formed from adsorption of asymmetric dialkyl disulfides on gold, LANGMUIR, 15(17), 1999, pp. 5440-5443
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Citation: W. Geyer et al., Electron-induced crosslinking of aromatic self-assembled monolayers: Negative resists for nanolithography, APPL PHYS L, 75(16), 1999, pp. 2401-2403