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Upadhyaya, A
Glazier, JA
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Authors:
da Rosa, EBO
Goncalves, S
de Almeida, RMC
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Krug, C
da Rosa, EBO
de Almeida, RMC
Morais, J
Baumvol, IJR
Salgado, TDM
Stedile, FC
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Authors:
Krug, C
da Rosa, EBO
de Almeida, RMC
Morais, J
Baumvol, IJR
Salgado, TDM
Stedile, FC
Citation: C. Krug et al., Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si, PHYS REV L, 85(19), 2000, pp. 4120-4123