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Results: 1-9 |
Results: 9
"Creatio ex nihilo" and the theology of Saint Augustine. The Anti-Manichaean polemic and beyond
Authors: van den Berg, JA
Citation: Ja. Van Den Berg, "Creatio ex nihilo" and the theology of Saint Augustine. The Anti-Manichaean polemic and beyond, VIGIL CHRIS, 55(1), 2001, pp. 111-113
Studies of damage in low-power reactive-ion etching of III-V semiconductors
Authors: Rahman, M Deng, LG Wilkinson, CDW van den Berg, JA
Citation: M. Rahman et al., Studies of damage in low-power reactive-ion etching of III-V semiconductors, J APPL PHYS, 89(4), 2001, pp. 2096-2108
Cluster formation during annealing of ultra-low-energy boron-implanted silicon
Authors: Collart, EJH Murrell, AJ Foad, MA van den Berg, JA Zhang, S Armour, D Goldberg, RD Wang, TS Cullis, AG
Citation: Ejh. Collart et al., Cluster formation during annealing of ultra-low-energy boron-implanted silicon, J VAC SCI B, 18(1), 2000, pp. 435-439
Photochemical oxidation of C-14-labelled oxalic acid by cerium(IV) sulfatein acidic solution
Authors: van den Berg, JA Breet, ELJ Pienaar, JJ
Citation: Ja. Van Den Berg et al., Photochemical oxidation of C-14-labelled oxalic acid by cerium(IV) sulfatein acidic solution, S AFR J C-S, 53(2), 2000, pp. 119-124
The production and use of ultralow energy ion beams
Authors: Goldberg, RD Armour, DG van den Berg, JA Cook, CEA Whelan, S Zhang, S Knorr, N Foad, MA Ohno, H
Citation: Rd. Goldberg et al., The production and use of ultralow energy ion beams, REV SCI INS, 71(2), 2000, pp. 1032-1035
Low-energy grazing-angle argon-ion irradiation of silicon: A viable optionfor cleaning?
Authors: Zalm, PC van den Berg, JA van Berkum, JGM Bailey, P Noakes, TCQ
Citation: Pc. Zalm et al., Low-energy grazing-angle argon-ion irradiation of silicon: A viable optionfor cleaning?, APPL PHYS L, 76(14), 2000, pp. 1887-1889
Growth of carbon thin film by low-energy mass-selected ion beam deposition
Authors: Ohno, H van den Berg, JA Nagai, S Armour, DG
Citation: H. Ohno et al., Growth of carbon thin film by low-energy mass-selected ion beam deposition, NUCL INST B, 148(1-4), 1999, pp. 673-677
Design considerations for low damage process plasmas
Authors: Rahman, M Deng, LG Boyd, A Ribayrol, A Wilkinson, CDW van den Berg, JA Armour, DG
Citation: M. Rahman et al., Design considerations for low damage process plasmas, MICROEL ENG, 46(1-4), 1999, pp. 299-302
Contribution of atomic and molecular ions to dry-etch damage
Authors: Deng, LG Rahman, M van den Berg, JA Wilkinson, CDW
Citation: Lg. Deng et al., Contribution of atomic and molecular ions to dry-etch damage, APPL PHYS L, 75(2), 1999, pp. 211-213
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