Authors:
Brockhoff, AM
van der Weg, WF
Habraken, FHPM
Citation: Am. Brockhoff et al., Hot-wire produced atomic hydrogen: effects during and after amorphous-silicon deposition, THIN SOL FI, 395(1-2), 2001, pp. 87-91
Authors:
Feenstra, KF
Alkemade, PFA
Algra, E
Schropp, REI
van der Weg, WF
Citation: Kf. Feenstra et al., Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films, PROG PHOTOV, 7(5), 1999, pp. 341-351
Citation: Eag. Hamers et al., Positive ions as growth precursors in plasma enhanced chemical vapor deposition of hydrogenated amorphous silicon, APPL PHYS L, 75(5), 1999, pp. 609-611