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Results: 1-10 |
Results: 10

Authors: Wallinga, J Nilsson, D van der Weg, WF Schropp, REI
Citation: J. Wallinga et al., Light scattering coefficients for textured SnO, SOL EN MAT, 69(1), 2001, pp. 69-78

Authors: Biswas, P Barkema, GT Mousseau, N van der Weg, WF
Citation: P. Biswas et al., Efficient tight-binding Monte Carlo structural sampling of complex materials, EUROPH LETT, 56(3), 2001, pp. 427-433

Authors: Vink, RLC Barkema, GT van der Weg, WF
Citation: Rlc. Vink et al., Raman spectra and structure of amorphous Si - art. no. 115210, PHYS REV B, 6311(11), 2001, pp. 5210

Authors: Brockhoff, AM van der Weg, WF Habraken, FHPM
Citation: Am. Brockhoff et al., Hot-wire produced atomic hydrogen: effects during and after amorphous-silicon deposition, THIN SOL FI, 395(1-2), 2001, pp. 87-91

Authors: Vink, RLC Barkema, GT van der Weg, WF Mousseau, N
Citation: Rlc. Vink et al., Fitting the Stillinger-Weber potential to amorphous silicon, J NON-CRYST, 282(2-3), 2001, pp. 248-255

Authors: Brockhoff, AM van der Weg, WF Habraken, FHPM
Citation: Am. Brockhoff et al., The effects of hot-wire atomic hydrogen on amorphous silicon, J APPL PHYS, 89(5), 2001, pp. 2993-3000

Authors: Biebericher, ACW Bezemer, J van der Weg, WF Goedheer, WJ
Citation: Acw. Biebericher et al., Deposition rate in modulated radio-frequency silane plasmas, APPL PHYS L, 76(15), 2000, pp. 2002-2004

Authors: Feenstra, KF Alkemade, PFA Algra, E Schropp, REI van der Weg, WF
Citation: Kf. Feenstra et al., Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films, PROG PHOTOV, 7(5), 1999, pp. 341-351

Authors: Hamers, EAG Bezemer, J van der Weg, WF
Citation: Eag. Hamers et al., Positive ions as growth precursors in plasma enhanced chemical vapor deposition of hydrogenated amorphous silicon, APPL PHYS L, 75(5), 1999, pp. 609-611

Authors: Acco, S Williamson, DL van Sark, WGJHM Sinke, WC van der Weg, WF
Citation: S. Acco et al., Nanoclustering of hydrogen in ion-implanted and plasma-grown amorphous silicon, PHYS REV B, 58(19), 1998, pp. 12853-12864
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