S. Hirasawa et al., ANALYSIS OF DRYING SHRINKAGE AND FLOW DUE TO SURFACE-TENSION OF SPIN-COATED FILMS ON TOPOGRAPHIC SUBSTRATES, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 438-444
In semiconductor manufacturing processes, it is important that the SiO
2 isolation films around aluminum connection lines have Bat surfaces i
n order to produce the multilayered connection lines used in high-dens
ity devices. In this paper, we analyzed transient changes, in the thic
kness distributions of a liquid-SOG (Spin-on-Glass) film on a two-dime
nsionally (2-D) grooved substrate during the evaporative shrinking pro
cess. The Bow due Co surface tension of the shrinking liquid film was
calculated, Since the film is thin, a boundary layer approximation cou
ld be applied, and fourth-order differential equations of film thickne
ss were solved using an iteration method. The viscosity and the shrink
age rate were assumed to he functions of the concentration of the solv
ent in the film, When the parameter of ratio [(surface tension)/{(visc
osity) x (shrinking speed)}] is large and the width of the grooves is
small, final surface undulations of the film are shallow, The effect o
f the centrifugal force was also analyzed.