DIAGNOSTIC AND MONITORING TOOLS OF LARGE-SCALE SI-MANUFACTURING - TRACE-ANALYTICAL TOOLS AND TECHNIQUES IN SI-WAFER MANUFACTURING

Citation
L. Fabry et al., DIAGNOSTIC AND MONITORING TOOLS OF LARGE-SCALE SI-MANUFACTURING - TRACE-ANALYTICAL TOOLS AND TECHNIQUES IN SI-WAFER MANUFACTURING, IEEE transactions on semiconductor manufacturing, 9(3), 1996, pp. 428-436
Citations number
86
Categorie Soggetti
Engineering, Eletrical & Electronic","Engineering, Manufacturing","Physics, Applied
ISSN journal
08946507
Volume
9
Issue
3
Year of publication
1996
Pages
428 - 436
Database
ISI
SICI code
0894-6507(1996)9:3<428:DAMTOL>2.0.ZU;2-5
Abstract
In order to facilitate fast corrective actions, all process media, cru cial process steps and intermediate product stages of wafering must be monitored by suitable analytical tools. The analyzes have to provide reliable, relevant and real-time results at justifiable economy. Prefe rably, they should be serviceable in on-line configuration under stric t SPC conditions, The following chapters outline the performance of th e few analytical techniques, that optimally satisfy these requirements .