L. Fabry et al., DIAGNOSTIC AND MONITORING TOOLS OF LARGE-SCALE SI-MANUFACTURING - TRACE-ANALYTICAL TOOLS AND TECHNIQUES IN SI-WAFER MANUFACTURING, IEEE transactions on semiconductor manufacturing, 9(3), 1996, pp. 428-436
In order to facilitate fast corrective actions, all process media, cru
cial process steps and intermediate product stages of wafering must be
monitored by suitable analytical tools. The analyzes have to provide
reliable, relevant and real-time results at justifiable economy. Prefe
rably, they should be serviceable in on-line configuration under stric
t SPC conditions, The following chapters outline the performance of th
e few analytical techniques, that optimally satisfy these requirements
.