Rk. Nurani et al., IN-LINE DEFECT SAMPLING METHODOLOGY IN YIELD MANAGEMENT - AN INTEGRATED FRAMEWORK, IEEE transactions on semiconductor manufacturing, 9(4), 1996, pp. 506-517
In this paper we provide an integrated framework for designing the opt
imal defect sampling strategy for wafer inspection, which is crucial i
n yield management of state-of-the-art technologies, We present a comp
rehensive cost-based methodology which allows us to achieve the trade-
off between the cost of inspection and the cost of yield impact of the
undetected defects, We illustrate the effectiveness of our methodolog
y using data from several leading fablines across the world, We demons
trate that this work has already caused a significant change in the sa
mpling practices in these fablines especially in the area of defect da
ta preprocessing (declustering), in-line defect based yield prediction
, and optimization of wafer inspection equipment allocation.