H. Xie et al., FUZZY-LOGIC MODELS FOR THERMALLY BASED MICROELECTRONIC MANUFACTURING PROCESSES, IEEE transactions on semiconductor manufacturing, 8(3), 1995, pp. 219-227
This paper presents fuzzy logic models (FLM) to simulate two thermally
based microelectronic manufacturing processes: the (pool boiling'' in
vapor phase soldering and silicon deposition process in a horizontal
chemical vapor deposition (CVD) reactor, After a brief discussion of t
he various input-output models, we present our general approach to the
development of FLM's, followed by their application to the two case s
tudies, For the pool boiling, experimental data are used to develop th
e fuzzy logic model, Results show that the FLM not only simulates the
different regions of the pool boiling curve satisfactorily, but also f
aithfully represents the two transitions, For the CVD process, pseudo-
analytical equations from Eversteyn's paper are used to generate data
under simulated production conditions, Results show that the model can
describe the process very well, The physico-fuzzy model, incorporatin
g the physical understanding of the process, is shown to improve the m
odel's extrapolation capability.